2017
DOI: 10.1557/adv.2017.356
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A Model for Estimating Chemical Potentials in Ternary Semiconductor Compounds: the Case of InGaAs

Abstract: In ab initio modeling of doped semiconductors, estimation of defect formation energies involving substitutional sites of ternary compounds is ambiguous due to an approximate treatment of chemical potential of the substituted atoms. We propose a model of assigning fractions of the formation energy to individual atoms of a ternary semiconductor and test it on InGaAs. The accuracy of this approximation is on the order of 0.1 eV/atom and is expected to be sufficient for many practical purposes.

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Cited by 3 publications
(6 citation statements)
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“…In Ref. [ 27 ], we introduced a way of computing Ef from only structures and energies of compounds, similarly to what is typically done for defect in monoelemental materials [10][11][12][13][14][15][18][19][20][21][22][23][24][25][26] . This is achieved by assigning a fraction f of formation energy Eform of InGaAs (computed vs bulk In, Ga, As) is assigned to each type of constituent atoms (In, Ga, As) as Eform(InGaAs) = Eform (InGaAs)×( fIn+fGa+fAs) = (E(In)+E(Ga)+2E(As))/4…”
Section: Methodsmentioning
confidence: 99%
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“…In Ref. [ 27 ], we introduced a way of computing Ef from only structures and energies of compounds, similarly to what is typically done for defect in monoelemental materials [10][11][12][13][14][15][18][19][20][21][22][23][24][25][26] . This is achieved by assigning a fraction f of formation energy Eform of InGaAs (computed vs bulk In, Ga, As) is assigned to each type of constituent atoms (In, Ga, As) as Eform(InGaAs) = Eform (InGaAs)×( fIn+fGa+fAs) = (E(In)+E(Ga)+2E(As))/4…”
Section: Methodsmentioning
confidence: 99%
“…43 This gives (6) The residual R = Ac -B is then a measure of the accuracy of this approximation. Based on the eight compounds listed above, the errors in formation energies of all structures (computed from the residual R) are on the order of 0.05 eV/atom 27 and are acceptable for the purpose of this work.…”
Section: Methodsmentioning
confidence: 99%
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