The conventional charged device model (CDM) test methods for large-scale integrated (LSI) circuits have not prescribed the device capacitance; furthermore, the CDM sensitivity has been represented by the withstand voltage. Also, a method for measuring the voltage of small objects such as LSI circuits has not been established. For these reasons, the failure voltages obtained with every kind of tester have varied, and it could not be judged whether the charged LSI circuit would fail or not in CDM events. To solve these problems, we defined the failure factor as the excess mobile charge which could be measured by the newly developed coulomb meter. In addition, we developed a new CDM tester with the coulomb meter and obtained the excess mobile charge and the device capacitance. The CDM tester showed that several logic MOS LSI circuits failed at their inherent constant charge. However, when the charge in low capacities was measured by the coulomb meter, the internal circuit showed a step transient response. This problem could be alleviated considerably by replacing the metal probe with a ceramic one. By using this coulomb meter, we investigated the basic characteristics of the device capacitance. Consequently, the device capacitance versus the distance between the LSI circuit and the ground plane and the relationship between each pin's capacitance and the applied voltage became clear. In conclusion, the basic failure factors in the CDM could be made clear; then it could be judged by the coulomb meter whether the charged LSI circuits would fail or not in CDM events.