A new crystallization technique of Si films on glass substrate using thermal plasma jet

Kaku, Hirotaka; Higashi, Seiichiro; Taniguchi, Hitoshi; Murakami, Hideki; Miyazaki, Seiichi

doi:10.1016/j.apsusc.2004.10.059

Cited by 41 publications

(27 citation statements)

References 5 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Due to the high ion temperature, the overall gas temperature is typically several 1000 K and this plasma type is therefore not considered suitable for the treatment of heat-sensitive materials such as TE scaffolds. Equilibrium plasmas are mainly applied for the surface modification of metallic and silicon-wafer surfaces which can withstand the high operating gas temperatures to deposit a thin diamond-like coating, zinc oxide coatings and silicone films [191][192][193][194]. Other application fields can be found in the field of nanoparticle production and the destruction of hazardous waste [195].…”

Section: Plasma Set-ups Used For the Treatment Of Nanofibrous Te Scafmentioning

confidence: 99%

Fabrication and Plasma Modification of Nanofibrous Tissue Engineering Scaffolds

et al. 2020

View full text Add to dashboard Cite

This paper provides a comprehensive overview of nanofibrous structures for tissue engineering purposes and the role of non-thermal plasma technology (NTP) within this field. Special attention is first given to nanofiber fabrication strategies, including thermally-induced phase separation, molecular self-assembly, and electrospinning, highlighting their strengths, weaknesses, and potentials. The review then continues to discuss the biodegradable polyesters typically employed for nanofiber fabrication, while the primary focus lies on their applicability and limitations. From thereon, the reader is introduced to the concept of NTP and its application in plasma-assisted surface modification of nanofibrous scaffolds. The final part of the review discusses the available literature on NTP-modified nanofibers looking at the impact of plasma activation and polymerization treatments on nanofiber wettability, surface chemistry, cell adhesion/proliferation and protein grafting. As such, this review provides a complete introduction into NTP-modified nanofibers, while aiming to address the current unexplored potentials left within the field.

show abstract

Section: Plasma Set-ups Used For the Treatment Of Nanofibrous Te Scafmentioning

confidence: 99%

Fabrication and Plasma Modification of Nanofibrous Tissue Engineering Scaffolds

et al. 2020

View full text Add to dashboard Cite

show abstract

“…More challenging issue is formation of single-crystalline silicon films at predetermined position on glass and plastics. We have proposed thermal plasma jet (TPJ) annealing technique to fabricate LTPS transistors [4,5]. Because of its simple structure and atmospheric pressure process, TPJ enables low cost fabrication compared with ELA.…”

Section: Introductionmentioning

confidence: 99%

Atmospheric pressure plasma processing and layer transfer technique for thin-film device fabrication on glass and plastic substrates

Higashi

2014

2014 International Workshop on Junction Technology (IWJT)

View full text Add to dashboard Cite

Crystalline growth from melt during microthermal-plasma-jet (µ-TPJ) irradiation to amorphous silicon (a-Si) film has been directly observed by highspeed camera. Long lateral growth perpendicular to the oval-shaped liquid-solid interface results in formation of random grain boundaries (GBs). Introduction of strip pattern markedly reduces random GBs and enables singlecrystalline growth at predetermined channel regions. Nand p-channel thin-film transistors (TFTs) showed high performance and small characteristic variability, and operation of 8-bit shift register at a supply voltage of 5V with the clock frequency of 50 MHz has been achieved. In addition, we propose a local layer transfer technique utilizing meniscus force of water, which enables formation of single-crystalline silicon (100) layer on glass and polyethylene terephthalate (PET) substrates. High mobility TFTs of 1226 and 609 cm 2 V -1 s -1 , respectively, have been successfully fabricated on each substrate.

show abstract

“…Depending on the irradiation conditions, SPC, leading-wave crystallization (LWC), high-speed lateral crystallization (HSLC), and granular crystal growth of a-Si have been observed in the microsecond time domain on the basis of high-speed camera (HSC) observations. [21][22][23][24] However, in the case of ultra-rapid crystallization of a-Ge, there is almost no report on its mechanism. In addition, the relationship between the crystallization mechanism and the resulting electrical characteristics such as carrier concentration and mobility is still a matter of research.…”

Section: Introductionmentioning

confidence: 99%

Investigation on electrical characteristics of TFTs fabricated with germanium films crystallized by atmospheric-pressure micro thermal plasma jet irradiation

Sato¹,

Hanafusa²,

Higashi³

2022

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

Crystalline-germanium (c-Ge) is an attractive material for a thin-film transistor (TFT) channel because of its high carrier mobility and applicability to a low-temperature process. We present the electrical characteristics of c-Ge crystallized by atmospheric pressure micro-thermal-plasma-jet (µ-TPJ). The µ-TPJ crystalized c-Ge showed the maximum Hall mobility of 1070 cm2·V−1·s−1 with its hole concentration of ~ 1016 cm−3, enabling us to fabricate the TFT with field-effect mobility (μ FE) of 196 cm2·V−1·s−1 and ON/OFF ratio (R ON/OFF) of 1.4 × 104. On the other hand, RON/OFFs and μFEs were dependent on the scanning speed of the TPJ, inferring different types of defects were induced in the channel regions. These findings show not only a possibility of the TPJ irradiation as a promising method to make a c-Ge TFT on insulating substrates.

show abstract

A new crystallization technique of Si films on glass substrate using thermal plasma jet

Cited by 41 publications

References 5 publications

Fabrication and Plasma Modification of Nanofibrous Tissue Engineering Scaffolds

Fabrication and Plasma Modification of Nanofibrous Tissue Engineering Scaffolds

Atmospheric pressure plasma processing and layer transfer technique for thin-film device fabrication on glass and plastic substrates

Investigation on electrical characteristics of TFTs fabricated with germanium films crystallized by atmospheric-pressure micro thermal plasma jet irradiation

Contact Info

Product

Resources

About