A new methodology for quantifying OPC recipe accuracy

Ziger, David H.; Gerold, Dave; King, Charly; Amoroso, F.; Tuttle, Joshua; Lugg, Robert

doi:10.1117/12.633172

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Cited by 3 publications

(2 citation statements)

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“…5 This approach has been extended to include visualization techniques that provide the user with rapid interpretation of process window results.…”

Section: Nomentioning

confidence: 99%

Intelligent visualization of lithography violations

Ziger

2007

SPIE Proceedings

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“…5 This approach has been extended to include visualization techniques that provide the user with rapid interpretation of process window results.…”

Section: Nomentioning

confidence: 99%

Intelligent visualization of lithography violations

Ziger

2007

SPIE Proceedings

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“…But, this presents a problem: What if one solution improves the result at some evaluation points but degrades results for others? D. Ziger et al 4 has proposed one new methodology for quantifying OPC recipe accuracy by drawing the recipe comparison matrix. In this paper, we extend the LRC based recipe qualification process to use a point-to-point comparison of quality.…”

Section: Introductionmentioning

confidence: 99%

LRC Based OPC Recipe Qualification

Liang¹,

Lugg²

2012

ECS Trans.

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Typical IC layouts are consisting of simple shapes with 90 degree corners. The high-spatial-frequency components of the mask spectrum cut off by the low-pass pupil will result in rounded images and pattern distortions. Although optical proximity correction (OPC) is used to address this issue as a standard industry practice, there are no theoretically perfect corrections due to some physical or chemical limitations. Therefore, how to qualify the correction results has become a problem. In this paper, the lithography rule check (LRC) based OPC recipe qualification is proposed. By extracting and grouping the LRC databases, the point-to-point post-OPC comparison matrix is shown. Finally, this new methodology can be integrated into the regression flow. When changing to a new software version or different OPC flow, this new validation methodology can not only tell the differences, but also report if there are any OPC quality degradations.

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