2020
DOI: 10.1063/1.5131101
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A new microwave coupling scheme for high intensity highly charged ion beam production by high power 24–28 GHz SECRAL ion source

Abstract: The efficiency of the microwave-plasma coupling is a key issue to enhance the performance of electron cyclotron resonance ion sources (ECRISs) in terms of higher ion beam intensity yield. The coupling properties are affected by the microwave coupling scheme, especially for the high frequency (f > 20 GHz) and high power (P > 5 kW) ECR ion sources. Based on the study of 24 GHz SECRAL ion source performances working at different launching systems, a new microwave coupling scheme, called the Vlasov l… Show more

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Cited by 9 publications
(2 citation statements)
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“…The source performances in terms of charge states and extracted currents has been explained by taking into account the different patterns of the electromagnetic field that are excited into the cavity, for a specific frequency (or set of frequencies) Mascali et al [9]; Gammino et al [10]. An improved coupling between microwaves and plasma is a key factor to design more powerful electron cyclotron resonance and microwave ion sources Hitz et al [11]; Zhao et al [12]; Xie et al [13]; Guo et al [14]; Mauro et al [15]. As said, the electron density is proportional to the square of the microwave pumping frequency: the higher the frequency the higher the microwave power the source plasma can absorb before the onset of instabilities.…”
Section: The Microwave Injection Systemmentioning
confidence: 99%
“…The source performances in terms of charge states and extracted currents has been explained by taking into account the different patterns of the electromagnetic field that are excited into the cavity, for a specific frequency (or set of frequencies) Mascali et al [9]; Gammino et al [10]. An improved coupling between microwaves and plasma is a key factor to design more powerful electron cyclotron resonance and microwave ion sources Hitz et al [11]; Zhao et al [12]; Xie et al [13]; Guo et al [14]; Mauro et al [15]. As said, the electron density is proportional to the square of the microwave pumping frequency: the higher the frequency the higher the microwave power the source plasma can absorb before the onset of instabilities.…”
Section: The Microwave Injection Systemmentioning
confidence: 99%
“…The source performances in terms of charge states and extracted currents has been explained by taking into account the different patterns of the electromagnetic field that is excited into the cavity, for a specific frequency (or set of frequencies) [1,2]. In order to enhance the source performances, several approaches have been used in the past years, such as the modification of the plasma cavity trying to better match the confining magnetic field profile [3], and the improvement of the microwave injection system by using modified or better cavity-matched waveguide configurations [4][5][6][7].…”
Section: Introductionmentioning
confidence: 99%