A New Plasma Source for Large-Area Deposition of ¥ìc-Si

Hwang, Doo Sup; Lee, Seung Yoon; Lee, Heon Min; Kim, Sang Jin; Kim, Gil Jun

doi:10.3938/jkps.55.2432

Cited by 2 publications

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“…The same trends can be observed in the experimental data depicted in Figure b as well. In terms of the main interest of this study, i.e., the deposition of silicon thin films for solar cells by VHF PECVD, it is typically operated in the region where the power density is relatively low and hence the discharge pattern is dominated by the standing wave effect, which, in fact, has been confirmed by numerous studies (the frequency ranges from 40 to 200 MHz in the cited references) . On the other hand, the wavelength in the plasma region is assumed to be 1.6 m (∼53% of the value in vacuum), which is also reasonable based on the reported wavelengths described previously.…”

Section: Description Of Numerical Simulationmentioning

confidence: 88%

“…However, the non‐uniform discharge caused by the standing wave effect imposes limitation on achieving uniform thin film deposition in large‐area VHF PECVD. Up to now, several methods have been proposed to resolve the technological bottleneck, including lens‐shaped electrode, ladder‐shaped electrode, or dual comb‐type electrodes with phase modulation, superposition of two standing waves that are alternatively ignited and multiple feeding points . Although all the above‐mentioned methods could significantly improve the uniformity of VHF plasmas, most of them might be limited to a fixed frequency and a specific operation window because they are based on the design concept that the configuration of special shaped electrode or the number and arrangement of feeding points is designed for a given standing wave pattern.…”

Section: Introductionmentioning

confidence: 99%

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Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave

Chen

Hsieh

et al. 2013

Plasma Process. Polym.

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An innovative technique, i.e., creating a traveling wave by launching two specific standing waves at the same time, is proposed to generate uniform large‐area very high frequency (VHF) plasmas. The viability of this approach has been verified by numerical simulation in this study. The electric field distribution for each standing wave is controlled by the phase difference between the corresponding two feeding points (φ) placed on opposite sides of electrode and designated to produce a specific standing wave pattern. The simulated electric filed distributions obtained at various φ are consistent with numerous experimental works. By applying these two standing waves at the same time, a traveling wave can be lanuched as the conditions that these two standing waves must have the same amplitude and be spatially and temporally out of phase by 90° are met.

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Section: Description Of Numerical Simulationmentioning

confidence: 88%

Section: Introductionmentioning

confidence: 99%

Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave

Chen

Hsieh

et al. 2013

Plasma Process. Polym.

View full text Add to dashboard Cite

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Generation of uniform large-area very high frequency plasmas by launching two specific standing waves simultaneously

Chen

Hsieh

et al. 2014

Journal of Applied Physics

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With the characteristics of higher electron density and lower ion bombardment energy, large-area VHF (very high frequency) plasma enhanced chemical vapor deposition has become an essential manufacturing equipment to improve the production throughput and efficiency of thin film silicon solar cell. However, the combination of high frequency and large electrodes leads to the so-called standing wave effect causing a serious problem for the deposition uniformity of silicon thin film. In order to address this issue, a technique based on the idea of simultaneously launching two standing waves that possess similar amplitudes and are out of phase by 90° in time and space is proposed in this study. A linear plasma reactor with discharge length of 54 cm is tested with two different frequencies including 60 and 80 MHz. The experimental results show that the proposed technique could effectively improve the non-uniformity of VHF plasmas from >±60% when only one standing wave is applied to <±10% once two specific standing waves are launched at the same time. Moreover, in terms of the reactor configuration adopted in this study, in which the standing wave effect along the much shorter dimension can be ignored, the proposed technique is applicable to different frequencies without the need to alter the number and arrangement of power feeding points.

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A New Plasma Source for Large-Area Deposition of ¥ìc-Si

Cited by 2 publications

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Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave

Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave

Generation of uniform large-area very high frequency plasmas by launching two specific standing waves simultaneously

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