2021
DOI: 10.1186/s41476-021-00153-y
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A new route for caesium lead halide perovskite deposition

Abstract: Inorganic metal halide perovskites are relevant semiconductors for optoelectronic devices. The successful deposition of thin films of CsPbBr3 and CsPbCl3 has recently been obtained by Radio-Frequency magnetron sputtering. In this work we compare the morphological, structural and optical characteristics of the two materials obtained with this deposition technique. A detailed photoluminescence (PL) spectroscopy study of the as-grown samples was conducted at the macro and micro scale in a wide temperature range (… Show more

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Cited by 15 publications
(13 citation statements)
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“…The dynamic working pressure was 2 × 10 −6 atm and the deposition rate was between 5 and 7 × 10 −2 nms −1 . The samples were fully characterized concerning morphology, structure, and stoichiometry, as extensively described in [ 12 , 18 , 19 ].…”
Section: Methodsmentioning
confidence: 99%
“…The dynamic working pressure was 2 × 10 −6 atm and the deposition rate was between 5 and 7 × 10 −2 nms −1 . The samples were fully characterized concerning morphology, structure, and stoichiometry, as extensively described in [ 12 , 18 , 19 ].…”
Section: Methodsmentioning
confidence: 99%
“…Room temperature XRD spectra indicate the presence of the correct crystalline phases CsPbCl 3 (ICDD PDF-4+ 18-0366), orthorhombic and tetragonal crystalline phases [13]. SEM analyses reported in [20] evidences a film morphology characterized by a continuous network of several tens of nanometer size crystals with a random distribution of bigger crystals with typical micrometer/sub-micrometer size. I-V characteristics performed with samples of different thickness on glass substrates, from 100 nm to 1.5 μm indicate a good homogeneity of the semiconductor material independently of the deposition time [21].…”
Section: Methodsmentioning
confidence: 91%
“…Cesium lead chloride (CsPbCl 3 ) films have been grown by Radio Frequency (RF) magnetron sputtering on plastic substrates equipped with an array of Cu electrodes using a Korvus HEX (Korvus Technology Ltd.) sputter equipped with an RF source working at 13.56 MHz [18][19][20]. The precursor salts (CsCl and PbCl 2 ) are grinded in equal molar ratio in a mixer mill (Retsch model MM400) to produce the powder used to manufacture the sputtering target: a 5 cm diameter disk realized by pressing the perovskite powder by means of a pneumatic press (11.5 MPa working pressure) for 24 h at 150 °C [21].…”
Section: Methodsmentioning
confidence: 99%
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“…Cesium lead chloride (CsPbCl 3 ) films have been deposited by Radio Frequency (RF) magnetron sputtering on plastic substrates equipped with an array of Cu electrodes [15] , [16] , [17] . The mechanochemical procedure described in [18] has been used to obtain the CsPbCl 3 powder.…”
Section: Methodsmentioning
confidence: 99%