“…The compositions of Ta-Si-N thin films have been investigated extensively in the past twenty years [28][29][30][31][32][33][34]. Chung et al [28,[30][31][32]34] found that the microstructure and the possible compounds in Ta-Si-N thin films were sensitive to the process parameters. Different phases, such as, Ta 2 Si, Ta 5 Si 3 , Ta 2 N, TaN and/or Ta 1-x Si x N rather than a particular compound are usually formed.…”