Zirconium dioxide (zirconia) has become more widely used for ceramic restorations and in clinical practice. Given its outstanding mechanical properties, chemical stability, biocompatibility, and aesthetics, zirconia is now widely used in restorations, fixed dental prostheses, and superstructures of implant-supported prostheses 1,2). Regarding zirconia bonding, 10-methacryloyloxydecyl dihydrogen phosphate (MDP) monomer is known to chemically bond with the zirconia surface 3-5). Moreover, mechanical adhesion still remains the main prerequisite to achieve durable retention of zirconia restorations 5-12). Given the acid resistant properties of zirconia, etching with hydrofluoric acid, which is used for silica-based ceramic materials, is ineffective 12,13). In many laboratory 5,7,9-12) and clinical 14,15) studies, alumina blasting is used to increase the roughness of the zirconia surface instead of etching with hydrofluoric acid. Recently, Ruyter et al. reported that etching with potassium hydrogen difluoride (KHF 2) and ammonium hydrogen difluoride (NH4HF2) was effective for zirconia 16). However, that study did not strictly evaluate whether etching with KHF 2 and NH4HF2 yielded micromechanical interlocking because the primer and the luting agent used on zirconia surface contained a functional monomer that could influence the bond strength. Therefore, the consensus on etching with KHF 2 and NH4HF2 on zirconia remains unclear. The purpose of the present study was to investigate the effect of etching with KHF2 and NH4HF2 on the bond strength of a self-polymerizing MMA resin bonded to zirconia. The MMA resin did not contain any functional monomers. The null hypothesis was that the shear bond strength would not be affected by each of the surface treatments. MATERIALS AND METHODS Materials The materials used in this laboratory investigation are listed in Table 1. A total of 44 disk specimens (11.4 mm in diameter and 2.8 mm thickness) were fabricated with yttrium-oxide-partially-stabilized zirconia ceramics (Katana, Kuraray Noritake Dental, Tokyo, Japan) and used as the bonding substrate. The following abrasive particles were used for alumina blasting: 50-70 μm alumina (Hi-Aluminas, Shofu, Kyoto, Japan). Two chemical powders were used as the experimental etching agents: potassium hydrogen difluoride (KHF 2; Tokyo Chemical Ind., Tokyo, Japan) and ammonium hydrogen difluoride (NH 4HF2; Sigma-Aldrich Japan, Tokyo, Japan). The melting point of KHF2 is 239ºC and that of NH4HF2 is 125ºC. A self-polymerizing resin was selected as the luting material. This resin consisted of a partially oxidized trin-butylborane (TBB) initiator (Super-Bond Catalyst V, Sun Medical, Moriyama, Japan), methyl methacrylate (MMA; Tokyo Chemical Ind.