2008
DOI: 10.1016/j.sna.2008.06.008
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A novel packaging method using wafer-level BCB polymer bonding and glass wet-etching for RF applications

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Cited by 12 publications
(4 citation statements)
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References 9 publications
(11 reference statements)
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“…Within the framework of micro/nanotechnologies, polymer-based materials such as polymethylmethacrylate (PMMA) [1,2], poly-vinyl chloride (PVC) [3][4][5], poly-vinyl alcohol (PVA) [6,7], polysiloxane (PSX) [8], SU-8 epoxy resin [9][10][11][12], polydimethylsiloxane (PDMS) [13][14][15][16][17], benzocyclobutene (BCB) [18][19][20][21][22],…, have shown very promising potentialities for a wide range of applications: sacrificial layers techniques, surface micropatterning, micro/nanomaterials integration, dielectric insulation, packaging (from wafer to system level),… Nevertheless, whatever the polymer chemistry, the mass-fabrication requirement has been carried out through the development of specific micro/nanolithography processes based on inkjet printing, spray coating, micro/nano contact printing, micromoulding, serigraphy shadow mask patterning and of course photolithography. This last process is well adapted to wafer level packaging techniques.…”
Section: Introductionmentioning
confidence: 99%
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“…Within the framework of micro/nanotechnologies, polymer-based materials such as polymethylmethacrylate (PMMA) [1,2], poly-vinyl chloride (PVC) [3][4][5], poly-vinyl alcohol (PVA) [6,7], polysiloxane (PSX) [8], SU-8 epoxy resin [9][10][11][12], polydimethylsiloxane (PDMS) [13][14][15][16][17], benzocyclobutene (BCB) [18][19][20][21][22],…, have shown very promising potentialities for a wide range of applications: sacrificial layers techniques, surface micropatterning, micro/nanomaterials integration, dielectric insulation, packaging (from wafer to system level),… Nevertheless, whatever the polymer chemistry, the mass-fabrication requirement has been carried out through the development of specific micro/nanolithography processes based on inkjet printing, spray coating, micro/nano contact printing, micromoulding, serigraphy shadow mask patterning and of course photolithography. This last process is well adapted to wafer level packaging techniques.…”
Section: Introductionmentioning
confidence: 99%
“…allows the determination of the final thickness hf deposited by spin coating. For a Newtonian solution (n =1), it is equivalent to the relation defined by Meyerhofer[26]:(22) For a Maxwellian solution (0 < n < 1), equation(21) still involves the arbitrary radius parameter r0 (as a consequence of the non-consideration of the gravity forces in the theoretic model, see below). This mathematical consequence prevents from having any information on the solvent surfacic evaporation per unit time parameter e. Nevertheless, equation(21)can be simplified in order to highlight the relation between the final thickness hf and the main parameter of the spin coating process, i.e.…”
mentioning
confidence: 99%
“…One of the promising candidates of polymer adhesives for RF MEMS applications is benzo-cyclo-butene (BCB) from Dow Chemical Company. BCB is an organic resin with superior electrical, mechanical and thermal properties due to its high resistivity (10 19 Ω·cm), low loss tangent (0.0008–0.002), low permittivity (2.65), low moisture absorption (<0.2%), low out-gassing, low cure temperature (<250 °C), small volume shrinkage during curing (5–6%) and excellent dielectric stability over a wide frequency range [ 14 , 15 , 16 ]. Additionally, BCB as the intermediate bonding material offers the highest bond strength in comparison to other conventional bonding polymers [ 17 ].…”
Section: Introductionmentioning
confidence: 99%
“…Some of the more specialized approaches include localized laser heating [ 13 ], localization of UV-curable adhesive by centrifugal spinning [ 14 ], and transfer bonding of pre-formed benzocyclobutene (BCB) caps [ 15 ]. More common approaches to selective adhesive bonding are based on patterning of photosensitive adhesives by photolithography, or masking and etching of non-photosensitive adhesives [ 12 , 16 , 17 , 18 ]. However, patterning by either photolithography or etching typically requires partial cross-linking of the polymer adhesive, for example by baking.…”
Section: Introductionmentioning
confidence: 99%