“…Within the framework of micro/nanotechnologies, polymer-based materials such as polymethylmethacrylate (PMMA) [1,2], poly-vinyl chloride (PVC) [3][4][5], poly-vinyl alcohol (PVA) [6,7], polysiloxane (PSX) [8], SU-8 epoxy resin [9][10][11][12], polydimethylsiloxane (PDMS) [13][14][15][16][17], benzocyclobutene (BCB) [18][19][20][21][22],…, have shown very promising potentialities for a wide range of applications: sacrificial layers techniques, surface micropatterning, micro/nanomaterials integration, dielectric insulation, packaging (from wafer to system level),… Nevertheless, whatever the polymer chemistry, the mass-fabrication requirement has been carried out through the development of specific micro/nanolithography processes based on inkjet printing, spray coating, micro/nano contact printing, micromoulding, serigraphy shadow mask patterning and of course photolithography. This last process is well adapted to wafer level packaging techniques.…”