2000
DOI: 10.1109/55.887471
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A novel self-aligned fabrication process for microwave static induction transistors in silicon carbide

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Cited by 19 publications
(15 citation statements)
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“…As the electrons move further away from the emitter, the average velocity relaxes to the steady state value of 1. 6 10 cm/s for an electric field of 600 kV/cm. For higher values, the electric field as well as the velocity overshoot become substantially larger, and the difference in calculated collector current between DD and EMC further increases, since DD consistently underestimates the electron velocity in the channel.…”
Section: Discussionmentioning
confidence: 99%
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“…As the electrons move further away from the emitter, the average velocity relaxes to the steady state value of 1. 6 10 cm/s for an electric field of 600 kV/cm. For higher values, the electric field as well as the velocity overshoot become substantially larger, and the difference in calculated collector current between DD and EMC further increases, since DD consistently underestimates the electron velocity in the channel.…”
Section: Discussionmentioning
confidence: 99%
“…PBTs have been demonstrated on silicon [4], GaAs [5], and SiC [1], [6] for high frequency and high power applications; theoretical investigations include [2], [5], [7]- [9]. The present industrial effort toward the production of GaN PBTs must be supported by reliable modeling tools.…”
Section: Introductionmentioning
confidence: 99%
“…The breakdown voltages reported here ignore possible problems related to the high threading dislocation density observed in hetero-epitaxial growth, but provide estimates for the limits of capabilities of the GaN material. In particular, the simulation results indicate that the breakdown voltages obtainable with the GaN SIT may be comparable to SiC SIT, [6,7] and still higher values may be obtained with the use of AlGaN. Fig.…”
Section: Effect Of Incorporation Of Alganmentioning
confidence: 74%
“…3. The dimensions of the device were selected to be similar to the values used for SiC and GaN devices [4,7] and a range of values for the source length was investigated. The source-to-gate spacing was adjusted to safely avoid breakdown in this region for the range of gate voltages used in this work.…”
Section: Methodsmentioning
confidence: 99%
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