A novel setup for spectroscopic ellipsometry using an acousto-optic tuneable filter

Fukarek, W.; Keudell, Achim von

doi:10.1063/1.1145466

Cited by 14 publications

(4 citation statements)

References 10 publications

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“…A rotating analyzer ellipsometer (RAE) was used to measure the ellipsometric angles  and  [26,27,28] during deposition of the films. Details of the ellipsometric setup are presented elsewhere [29]. All the experiments presented in this article were performed at a wavelength of 600 nm.…”

Section: B) Thin Film Analysismentioning

confidence: 99%

“…From the measured ellipsometric angles the complex refractive indices (n* = n -ik) of the films were determined by means of an optical model as described elsewhere [22,29]. For the in-situ investigations we always deposited films with a thickness leading to at least a full revolution in the - plane ( changes by more than 360°) to achieve high sensitivity for n as well as k. These thicknesses correspond to about 130 nm for dense and hard layers (n = 2.4) and 240 nm for soft polymer-like layers (n = 1.57).…”

Section: B) Thin Film Analysismentioning

confidence: 99%

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Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties

Schwarz-Selinger

Keudell

Jacob

1999

Journal of Applied Physics

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233

163

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Hydrocarbon films were prepared by electron cyclotron resonance (ECR) plasma deposition from different hydrocarbon source gases at varying ion energies. The source gases used were the saturated hydrocarbons CH4, C2H6, C3H8, C4H10 (n-and iso-) and the unsaturated hydrocarbons C2H4 and C2H2 as well as mixtures of these gases with hydrogen. Film deposition was analyzed in situ by real-time ellipsometry, and the resulting films ex situ by ion-beam analysis. On the basis of the large range of deposition parameters investigated, the correlation between hydrocarbon source gas, deposition parameters, and film properties was determined. The film properties are found to be influenced over a wide range not only by the energy of the impinging ions, but also by the choice of source gas. This is in contrast to a widely accepted study where no dependence of the film properties on the source gas was observed, this being ascribed to a 'lost-memory effect'. A strong correlation was found between the hydrogen content of the films and the film properties. This strong correlation is explained on the basis of the random-covalent-network model.

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Section: B) Thin Film Analysismentioning

confidence: 99%

Section: B) Thin Film Analysismentioning

confidence: 99%

Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties

Schwarz-Selinger

Keudell

Jacob

1999

Journal of Applied Physics

Self Cite

233

163

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“…The chamber pressure was 0.5 Pa for the ECR and 2.0 Pa for the CCP discharge. PLAQ is further equipped with in-situ ellipsometry operating at 632.8 nm to measure erosion and deposition rates at the substrate electrode in real time [16].…”

Section: Methodsmentioning

confidence: 99%

Carbon removal from tile gap structures with oxygen glow discharges

Schwarz-Selinger

Genoese

Hopf

et al. 2009

Journal of Nuclear Materials

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The removal of redeposited layers from tile gap structures with ITER-like geometries was investigated with various lowtemperature glow discharges in oxygen. The test structure consists of 19 mm deep gaps with widths ranging from 0.5 to 4 mm. Erosion rates inside the gaps are reduced compared with a directly exposed witness surface. Smallest erosion is found for the lowest particle energies. Erosion at the bottom of the gap increases linearly with the gap width. Erosion on the side walls drops nearly exponentially with increasing distance from the top. Side wall erosion dominates the total eroded amount for all cases investigated. The total eroded amount integrated over the whole inner gap surface is larger than the amount that would be eroded on a flat surface with an area identical to the gap opening.

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“…Hence we refer to the substrate position in this study as remote position and to this experimental configuration as remote ECR discharge. For flat samples an in situ ellipsometer operating at 632.8 nm can be used to measure erosion and deposition rates at the center of the substrate holder in real time [28]. Heating of the substrates is performed by radiation from the backside by a Boralectric heating element.…”

Section: Methodsmentioning

confidence: 99%

Fuel removal from tile gaps with oxygen discharges: reactivity of neutrals

et al. 2009

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Carbon removal in so-called remote areas, where no energetic species can reach the surface, is investigated with low-temperature glow discharges in pure oxygen. Plasma-deposited amorphous hydrogenated carbon thin films are used as a model system for redeposited films. Erosion measurements are performed on flat substrates as well as on two different 3D test structures. One design consists of 19 mm deep gaps with widths ranging from 0.5 to 4 mm to simulate ITER tile gaps. A second design consists of a flat box-like structure where particles can enter only through a narrow slit. Measurements are performed for substrate temperatures ranging from 290 to 580 K. Erosion rates follow an Arrhenius-type dependence on substrate temperature with an effective activation energy of 0.25 eV. While at room temperature the surface loss probability of the dominant eroding species is 50 % it becomes smaller at elevated temperatures. At elevated temperatures the films are not only removed faster but simultaneously erosion penetrates deeper into the gaps.

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A novel setup for spectroscopic ellipsometry using an acousto-optic tuneable filter

Abstract: Articles you may be interested inA novel miniature spectrometer using an integrated acoustooptic tunable filter Rev. Sci. Instrum. 65, 3653 (1994); 10.1063/1.1145201 Rapid scanning fluorescence spectroscopy using an acoustooptic tunable filter Rev.

Cited by 14 publications

References 10 publications

Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties

Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties

Carbon removal from tile gap structures with oxygen glow discharges

Fuel removal from tile gaps with oxygen discharges: reactivity of neutrals

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