A novel stochastic photo-thermoelasticity model according to a diffusion interaction processes of excited semiconductor medium

Abstract

A novel technique under the impact of stochastic heating due to the thermal effect of photothermal theory is investigated. Realistically, stochastic processes are taken on the boundary of the semiconductor medium. The interactions between optical, thermal, and mechanical waves in a half-space of the medium are studied according to the photo-thermoelasticity theory. The governing equations are described in one-dimensional elastic-electronic deformation. Laplace transforms with short-time approximation are used to analyze the main physical fields. To study the problem more realistically, some conditions are taken as random with white noise on the free surface of the elastic medium. The deterministic physical quantities are obtained with a stochastic calculus when a numerical inversion of the Laplace transform is applied. The silicon material is utilized to make the stochastic numerical simulation. The comparisons are carried out between the distributions of deterministic and stochastic (statistically, the mean and variance) the main physical quantities along different sample paths graphically and discussed.

Hygro-Photo-Thermoelastic Solid Cylinder under Moisture and Thermal Diffusivity with Two Temperatures

“…Alhashash et al [19] have proposed a mathematical-physical model based on a two-temperature thermoelasticity theory to describe the influence of moisture diffusivity on semiconductor materials. Lotfy et al [20] have developed a novel stochastic photo-thermoelasticity model by utilizing diffusion interaction processes within an excited semiconductor medium.…”