2018
DOI: 10.3390/app8112218
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A Novel Ultrasonic Cavitation Peening Approach Assisted by Water Jet

Abstract: Ultrasonic cavitation peening is an environmentally friendly technology to improve surface properties. In the traditional ultrasonic cavitation peening process, specimens have to be immersed in a liquid and temperature control is required, which limits the wide usage of this technology due to the geometry and complicated setup. In order to improve this process, water is slowly jetted (75 mL/min) into the gap between the sonotrode tip and specimen surface. The water jet makes the gap full of water. Thus, cavita… Show more

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Cited by 11 publications
(5 citation statements)
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“…A new approach to improving the ultrasonic cavitation peening (UCP) pressing process was proposed by Fushi Bai et al [ 134 ]. They proposed to introduce a water jet into the gap between the sonotrode and the workpiece to be burnished, which removes the ASTM-compliant water tank and temperature control system from the bench.…”
Section: Cavitation Peening Effectsmentioning
confidence: 99%
“…A new approach to improving the ultrasonic cavitation peening (UCP) pressing process was proposed by Fushi Bai et al [ 134 ]. They proposed to introduce a water jet into the gap between the sonotrode and the workpiece to be burnished, which removes the ASTM-compliant water tank and temperature control system from the bench.…”
Section: Cavitation Peening Effectsmentioning
confidence: 99%
“…Submerged self-resonating waterjet is a simple means with strong self-oscillating cavitation characteristics [1,2], which have been widely applied in the industries of cutting of solid materials, cleaning and burry removal of complicated mechanical products [3][4][5]. Over the past few years, deep-sea resources have attracted worldwide attention, and selfresonating waterjet also has broad applications in the exploitation of deep-sea mineral resources.…”
Section: Introductionmentioning
confidence: 99%
“…Quite recently, sonochemical techniques have been used in processing of semiconductor surfaces [5][6][7][8][9][10][11][12][13][14]. In this method, the main phenomenon is the acoustic cavitation, which enhances chemical reactions in a solution.…”
Section: Introductionmentioning
confidence: 99%