A numerical study of the effect of gas injection position in an inductively coupled plasma discharge

Kwon, Deuk Chul; Yoon, N. S.; Han, Jonggu; Shon, J. W.

doi:10.1016/j.cap.2008.03.022

Cited by 4 publications

(1 citation statement)

References 19 publications

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“…Plasma simulations by using a fluid model is useful in designing low temperature plasma processing systems: dry etcher, PECVD, plasma asher, ion doping systems [1][2][3][4]. Numerical model can be setup either by PIC (particle-in-cell) or by fluid model.…”

Section: Introductionmentioning

confidence: 99%

Numerical Modeling of Floating Electrodes in a Plasma Processing System

Joo¹

2015

Applied Science and Convergence Technology

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Fluid model based numerical analysis is done to simulate a plasma processing system with electrodes at floating potential. V f is a function of electron temperature, electron mass and ion mass. Commercial plasma fluid simulation softwares do not provide options for floating electrode boundary value condition. We developed a user subroutine in CFD−ACE+ and compared four different cases: grounded, dielectric, zero normal electric field and floating electric potential for a 2D−CCP (capacitively coupled plasma) with a ring electrode.

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Section: Introductionmentioning

confidence: 99%

Numerical Modeling of Floating Electrodes in a Plasma Processing System

Joo¹

2015

Applied Science and Convergence Technology

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Fluid Simulation of the Plasma Characteristics in an Inductively Coupled Plasma Source with Planar and Cylindrical Coils

et al. 2023

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Characterization of Gas Distribution Effect in Inductively Coupled Plasma System

Joo

2013

Journal of the Korean institute of surface engineering

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We have developed a 2D axi-symmetric numerical model for an inductively coupled plasma system in order to analyze gas mixing effect through a narrow gap shower head. For frictional flow, holes of 0.5 mm diameter and 2 mm length are approximately modeled in 2D. Gas velocity distribution 10 mm below the shower head showed 2 times difference between the center and the edge at 10 mTorr. At 10 mm above the wafer, it was increased to 6 times difference due to the pumping duct effect. The model with a 5 mm height buffer region of a shower head showed reasonable behavior of Ar discharge. The density of Ar metastable showed additional peak inside the buffer region around the edge holes.

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A numerical study of the effect of gas injection position in an inductively coupled plasma discharge

Cited by 4 publications

References 19 publications

Numerical Modeling of Floating Electrodes in a Plasma Processing System

Numerical Modeling of Floating Electrodes in a Plasma Processing System

Fluid Simulation of the Plasma Characteristics in an Inductively Coupled Plasma Source with Planar and Cylindrical Coils

Characterization of Gas Distribution Effect in Inductively Coupled Plasma System

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