2008
DOI: 10.1109/ted.2008.926665
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A Physical Model of High Temperature 4H-SiC MOSFETs

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Cited by 157 publications
(106 citation statements)
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“…Similarly to most semiconductor materials, the bandgap energy decreases as temperature increases, whilst the intrinsic concentration increases with temperature [30]. The mobility in SiC devices has a more complex dependency on temperature depending on doping levels and density of traps at the gate oxide/SiC interface resulting in bulk mobility to decrease but channel mobility to potentially increase with temperature [31]- [32]. Temperature effects on these parameters can be summarised by the empirical relations:…”
Section: Temperature Sensitive Electric Parameters In Sic Mosfetsmentioning
confidence: 99%
“…Similarly to most semiconductor materials, the bandgap energy decreases as temperature increases, whilst the intrinsic concentration increases with temperature [30]. The mobility in SiC devices has a more complex dependency on temperature depending on doping levels and density of traps at the gate oxide/SiC interface resulting in bulk mobility to decrease but channel mobility to potentially increase with temperature [31]- [32]. Temperature effects on these parameters can be summarised by the empirical relations:…”
Section: Temperature Sensitive Electric Parameters In Sic Mosfetsmentioning
confidence: 99%
“…These traps degrade the device performance by reducing the electron density and electron mobility in the transistor channel [17]. Since the trap densities and their occupation with electrons are very temperature dependent they have also a significant influence on the temperature characteristic of the SiC MOSFET.…”
Section: A Dc-currentmentioning
confidence: 99%
“…The dimensions and doping concentrations have been chosen in such a way that the characteristics of a 1.2 kV SiC MOSFET, manufactured by Cree Inc. (CMF2010D [28]), could be reproduced. The density of interface traps at the semiconductor-oxide boundary has been selected according to the analysis presented in the paper [17] and to adjust the IDS(VGS)-curve to the experimental result. The influence of the interface traps on the electron charge in the transistor channel can be seen in Fig.…”
Section: A Comparison Of Model and Device Simulationsmentioning
confidence: 99%
“…Moreover, various physic-based compact models have been proposed, some including crucial electro-thermal effects (e.g. [8]- [9]). …”
Section: Introductionmentioning
confidence: 99%