2014
DOI: 10.1016/j.sse.2014.03.009
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A physics-based scheme for potentials of a-Si:H TFT with symmetric dual gate considering deep Gaussian DOS distribution

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Cited by 4 publications
(5 citation statements)
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“…As one may see, the curve of the drain current as a function of gate voltage stretches out as the channel thickness increases. This prediction can also easily be confirmed by the observation in the surface potential calculation for different t si as given previously in Figure 4 in Reference [17].…”
Section: Resultssupporting
confidence: 84%
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“…As one may see, the curve of the drain current as a function of gate voltage stretches out as the channel thickness increases. This prediction can also easily be confirmed by the observation in the surface potential calculation for different t si as given previously in Figure 4 in Reference [17].…”
Section: Resultssupporting
confidence: 84%
“…We consider a typical DG n-type intrinsic a-Si:H TFT working under the dual-gate biased mode. The generalized schematic structure of DG a-Si:H TFT has been given in References [4,17,18]. For simplicity's sake, in what follows, we treated the density of trap states throughout the a-Si:H film in a homogeneous way and assumed the field distribution in the active layer to be approximately symmetrical.…”
Section: Approximation Of Potentials and Drain Current Modelmentioning
confidence: 99%
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“…To calculate the surface potential, other methods have been used. For example, very recently, Qin et al developed a novel scheme for surface potential of amorphous silicon TFTs by taking deep Gaussian and tail exponential distribution of the density of states into account [ 81 ]. In Qin et al’s model, the authors adopted Taylor expansion below threshold regime, and the principle of Lamber W function and Schroder series above threshold regime, as well as Chen et al’s model in Section 3.1 .…”
Section: Surface-potential-based Compact Modelsmentioning
confidence: 99%