“…Through silicon vias (TSVs) enable the vertical integration of separate dies to form a single 3D chip. The TSVbased 3D stacking technology promises better performances, including smaller footprint, higher bandwidth, lower power and higher interconnect density [1,2,3,4,5,6,7]. However, the reliability of TSVs may become a serious problem due to electromigration (EM) [1,2,3], which causes TSVs to have voids during field operation.…”