12th International Symposium on Power Semiconductor Devices &Amp; ICs. Proceedings (Cat. No.00CH37094)
DOI: 10.1109/ispsd.2000.856763
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A review of RESURF technology

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Cited by 272 publications
(91 citation statements)
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“…Characteristic are two distinct peaks of the electric field at the gate electrode and the drain contact. Further device optimization can therefore follow the ideas developed for lateral RESURF devices [14]. Fitting a curve to published experimental values of R DS (on) and breakdown voltage suggests a dependency R ON · A V ≈ V B 1.3 similar to the relationship derived for Superjunction transistors.…”
Section: Gan High Electron Mobility Transistormentioning
confidence: 70%
“…Characteristic are two distinct peaks of the electric field at the gate electrode and the drain contact. Further device optimization can therefore follow the ideas developed for lateral RESURF devices [14]. Fitting a curve to published experimental values of R DS (on) and breakdown voltage suggests a dependency R ON · A V ≈ V B 1.3 similar to the relationship derived for Superjunction transistors.…”
Section: Gan High Electron Mobility Transistormentioning
confidence: 70%
“…However to date, there has been no explanation as to why C conveys an advantage over Fe in breakdown voltage. In this letter, we use simulation, supported by dynamic R ON measurement, to show that another consequence of this vertical leakage path in compensated C-doped GaN is a reduced surface electric field (RESURF) effect [9]. RESURF effects increase breakdown voltage, however their applicability to C-doped GaN-on-Si devices has not been realized before.…”
Section: Introductionmentioning
confidence: 99%
“…The main static performance indexes for LDMOSFET (Lateral Double-diffused Metal-Oxide-Semiconductor Field-Effect Transistor) are the breakdown voltage (BV) and the specific on-resistance (R s,on ) [1,2,3]. The REBULF (REduced BULk Field) concept has been introduced to increase the BV of LDMOS [4,5].…”
Section: Introductionmentioning
confidence: 99%