1996
DOI: 10.1016/0304-3991(95)00144-1
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A rotating disk electropolishing technique for TEM sample preparation

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Cited by 15 publications
(9 citation statements)
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“…These methods have been applied to a broad range of materials [29][30][31], but mainly to metallic and semiconductor materials to avoid strain hardening and preparation artifacts due to high temperatures or ion irradiation [32]. These methods have been applied to a broad range of materials [29][30][31], but mainly to metallic and semiconductor materials to avoid strain hardening and preparation artifacts due to high temperatures or ion irradiation [32].…”
Section: Chemical and Electrolytic Methodsmentioning
confidence: 99%
“…These methods have been applied to a broad range of materials [29][30][31], but mainly to metallic and semiconductor materials to avoid strain hardening and preparation artifacts due to high temperatures or ion irradiation [32]. These methods have been applied to a broad range of materials [29][30][31], but mainly to metallic and semiconductor materials to avoid strain hardening and preparation artifacts due to high temperatures or ion irradiation [32].…”
Section: Chemical and Electrolytic Methodsmentioning
confidence: 99%
“…Then, they are subjected to twin jet electropolishing, whereby the central thinning of a sample is done to make it transparent to electrons (as shown in Figure 24 ). In 1996, Aebersold et al [ 163 ] prepared TEM samples by twin jet polishing and rotating electrodes of nickel base super alloys of γ-phase separated by the γ’ solution-matrix. The electropolishing was performed in a mixture of perchloric acid and methanol at 3 V and 7 V, T = 10 °C, v = 400 rpm.…”
Section: Micro-nano-scale Polishing—issues and Trendsmentioning
confidence: 99%
“… ( A ) Optical images of ( a ) sample, ( b ) slice sectioned from the sample using low-speed diamond saw (isomet), ( c ) slice after punching TEM disc ( d ) TEM disc ( e ) TEM disc after grinding and electropolishing (note the shiny contrast in the central portion due to electropolishing [ 59 ] (copyrights granted by author). ( B ) Schematic of twin jet electropolishing, (copyrights granted by Elsevier) [ 163 ] ( C ) Nano-structure based optical images of TEM samples in various forms is shown, ( a ) carbon coated, ( b ) mechanically milled, ( c ) free standing ribbon processed by rapid solidification, ( d ) small ribbon bonded to a slotted copper grid, ( e ) TEM image showing the powder particles on copper grid, ( f ) optical image of iron powder particles embedded in epoxy [ 59 ] (copyrights granted by author), ( D ) TEM results showing grain orientation of electropolished Al samples at 200 kV electrons, ( a , d ) cut-outs from larger ADF-STEM images in [001] and [011], ( b , e ) Fourier transforms, ( c , f ) diffraction patterns of ( a , d ) [ 29 ], (open access article distributed under the terms of the Creative Commons CC-BY license). …”
Section: Figurementioning
confidence: 99%
“…Principal component analysis (PCA) 27,31 was performed by means of the EM image processing system. 38 The images of unit cells or extracted subframes thereof were normalized to a mean value of 0 and a standard deviation of 1.…”
Section: Image Analysismentioning
confidence: 99%
“…We apply principal component analysis (PCA), a variant of correspondence analysis that has been proven to a be a powerful tool for elucidating structural characteristics and variability in electron microscopical images from various applications. [27][28][29][30][31][32]…”
Section: Introductionmentioning
confidence: 99%