2004
DOI: 10.1016/j.jelechem.2004.07.030
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A soft-solution electrochemical processing technique for preparing CdTe/n-Si(100) heterostructures

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Cited by 15 publications
(3 citation statements)
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“…The irreversible character of Te may be due to the reason that the low density of holes in the valence band leads to the decrease of oxidation rate related to the valence band holes [19]. The voltammetric characteristics of Te was essentially identical to the characteristics previously reported [20,21]. The electrochemical reactions for Te and Zn species can be described, respectively as follows:…”
Section: Elementsupporting
confidence: 64%
“…The irreversible character of Te may be due to the reason that the low density of holes in the valence band leads to the decrease of oxidation rate related to the valence band holes [19]. The voltammetric characteristics of Te was essentially identical to the characteristics previously reported [20,21]. The electrochemical reactions for Te and Zn species can be described, respectively as follows:…”
Section: Elementsupporting
confidence: 64%
“…In this sense, soft-solution processing ͑SSP͒ techniques of thin-film preparation appears to be an interesting alternative route to achieve these goals. 16 They can be defined as environmentally friendly processing, using aqueous solutions that seem to provide results similar to other processes using fluids ͑such as vapor, gas, and plasma͒ or beamvacuum processing, while consuming less total energy than other processing routes. [16][17][18] Electrodeposition is a typical "soft-solution processing" application which enables ͑in the present case͒ the formation of iron oxide thin films from an aqueous solution between room temperature and 100°C under atmospheric pressure.…”
mentioning
confidence: 99%
“…16 They can be defined as environmentally friendly processing, using aqueous solutions that seem to provide results similar to other processes using fluids ͑such as vapor, gas, and plasma͒ or beamvacuum processing, while consuming less total energy than other processing routes. [16][17][18] Electrodeposition is a typical "soft-solution processing" application which enables ͑in the present case͒ the formation of iron oxide thin films from an aqueous solution between room temperature and 100°C under atmospheric pressure. In addition to its capability of controlling composition and morphology by electrochemical parameters, the advantage of working in the lowtemperature domain becomes very attractive as soon as interdiffusion phenomena found at high temperatures becomes critical, as for example ͑as was mentioned above͒ for hybrid ferromagneticsemiconductor structure fabrication.…”
mentioning
confidence: 99%