This paper presents the first SPICE model of the transition metal dichalcogenide (TMD) field-effect transistor (FET), which is a promising candidate for flexible electronics. The model supports different transistor design parameters such as width, length, oxide thickness, and various channel materials (MoS 2 , WSe 2 , etc.), as well as the applied strain, which enables the evaluation of transistor-and circuit-level behavior under process variation and different levels of bending. We performed SPICE simulations on digital logic gates to explore the design space of both MoS 2 -and WSe 2 -based transistors, and to evaluate the projected performance of these circuits under applied strain. Our simulations show that WSe 2 circuits outperform MoS 2 and Si-based CMOS in terms of energy-delay product (EDP) by up to 1 order of magnitude, depending on applications. Finally, we investigate TMDFET's behavior under process variation.