Optoelectronic Devices and Properties 2011
DOI: 10.5772/14603
|View full text |Cite
|
Sign up to set email alerts
|

A Study of Adhesion of Silicon Dioxide on Polymeric Substrates for Optoelectronic Applications

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
3
0

Year Published

2015
2015
2023
2023

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(3 citation statements)
references
References 37 publications
0
3
0
Order By: Relevance
“…Due to its higher color stability (minimum color variation) 32 and the active role of free OH groups belonging to open-caged silsesquioxanes present at the outermost surface layer in the stabilization process (behavior similar to UV filters) 33 , AMF can be regarded as an anti-ageing polymer that succeeded to effectively absorb the UV light and limited the fade phenomenon 32 . Apart from conferring chemical inertness, corrosion and wear resistance, low gas permeation and high transparency 34 , the formation of ladder-like silsesquioxane structures by means of photochemical transformations has attractive features in terms of low cost, non-toxicity and eco-friendliness. In addition, the migration and local reorganization of fluoroalkyl and silsesquioxane units at the outermost layer and formation of microphase-segregated domains were found to induce a good water repellency and increased the overall resistance of AMF toward UV ageing.…”
Section: Photobehavior Of Pb72 and Amf Coatings During Accelerated Ag...mentioning
confidence: 99%
“…Due to its higher color stability (minimum color variation) 32 and the active role of free OH groups belonging to open-caged silsesquioxanes present at the outermost surface layer in the stabilization process (behavior similar to UV filters) 33 , AMF can be regarded as an anti-ageing polymer that succeeded to effectively absorb the UV light and limited the fade phenomenon 32 . Apart from conferring chemical inertness, corrosion and wear resistance, low gas permeation and high transparency 34 , the formation of ladder-like silsesquioxane structures by means of photochemical transformations has attractive features in terms of low cost, non-toxicity and eco-friendliness. In addition, the migration and local reorganization of fluoroalkyl and silsesquioxane units at the outermost layer and formation of microphase-segregated domains were found to induce a good water repellency and increased the overall resistance of AMF toward UV ageing.…”
Section: Photobehavior Of Pb72 and Amf Coatings During Accelerated Ag...mentioning
confidence: 99%
“…Due to its higher color stability (minimum color variation) 33 and the active role of free OH groups belonging to open-caged silsesquioxanes present at the outermost surface layer in the stabilization process (behavior similar to UV filters) 34 , AMF can be regarded as an anti-ageing polymer that succeeded to effectively absorb the UV light and limited the fade phenomenon 33 . Apart from conferring chemical inertness, corrosion and wear resistance, low gas permeation and high transparency 35 , the formation of ladder-like silsesquioxane structures by means of photochemical transformations has attractive features in terms of low cost, non-toxicity and eco-friendliness. In addition, the migration and local re-organization of fluoroalkyl and silsesquioxane units at the outermost layer and formation of microphasesegregated domains were found to induce a good water repellency and increased the overall resistance of AMF toward UV ageing.…”
Section: Scheme 4 Photo-oxidative Degradation Pathway Of Amfmentioning
confidence: 99%
“…Nano‐indentation and nanoscratch testing are alternative approaching methods. Both techniques have become important tools for probing the mechanical properties at the nanoscale materials …”
Section: Introductionmentioning
confidence: 99%