2011
DOI: 10.1016/j.solmat.2010.12.030
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A study of stabilization of P3HT/PCBM organic solar cells by photochemical active TiOx layer

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Cited by 54 publications
(31 citation statements)
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“…[165] A recent study by Li et al concluded that TiO x acts as a photochemically activated oxygen scavenger significantly enhancing the stability of P3HT:PCBM towards both UV exposure and oxygen. [166] M. Wang et al have applied thermally evaporated chromium oxide (CrO x ) between the active layer and the aluminum cathode to enhance stability. [167] Later, M. Wang et al showed a similar effect for copper oxide (CuO x ) as interface layer either alone or together with lithium fluoride.…”
Section: The Electron Transport Layermentioning
confidence: 99%
“…[165] A recent study by Li et al concluded that TiO x acts as a photochemically activated oxygen scavenger significantly enhancing the stability of P3HT:PCBM towards both UV exposure and oxygen. [166] M. Wang et al have applied thermally evaporated chromium oxide (CrO x ) between the active layer and the aluminum cathode to enhance stability. [167] Later, M. Wang et al showed a similar effect for copper oxide (CuO x ) as interface layer either alone or together with lithium fluoride.…”
Section: The Electron Transport Layermentioning
confidence: 99%
“…[ 26 ] Coating a passivation layer onto the surface of 3D nanostructured photoelectrode is a practical means to reduce the surface trap density which promotes photogenerated charge recombination at the semiconductor/electrolyte interface. [27][28][29] A number of techniques, such as atomic layer deposition (ALD), [ 30 ] spin coating, [ 31 ] electrochemical deposition, [ 3,32 ] sputtering, [ 7 ] and electron beam evaporation [ 7 ] have been developed to coat the passivation layer onto the surface of photoelectrodes. However, in most cases, it is diffi cult to achieve a continuous and conformal passivation layer on 3D surfaces of photoelectrodes, [ 29 ] even by ALD.…”
Section: Doi: 101002/adma201600437mentioning
confidence: 99%
“…The other is that the passivation layer can provide chemical resistance to the electrolyte for the photoactive semiconductor. Owing to the above benefits, passivation layers were fabricated by various kinds of techniques, such as atomic layer deposition (ALD) [30,31], electron beam evaporation [32], spin coating [33], electrochemical deposition [34], floating transfer [35] and chemical bath [36]. Among these, Wonyong Choi et al [30] had deposited Al 2 O 3 on the surface of WO 3 via ALD.…”
Section: Introductionmentioning
confidence: 99%