1985
DOI: 10.1016/0039-6028(85)90699-5
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A study of the cleaved InP surface by CPD and SPV topographies

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1986
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Cited by 16 publications
(8 citation statements)
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“…There is a substantial discrepancy between the local WF values measured along the surface for small surface areas, 47,48 which is related to surface lateral heterogeneity. While such effects are interesting, the WF data of polycrystalline materials are more representative when measured for larger surface areas.…”
Section: Effect Of Local Sitementioning
confidence: 99%
“…There is a substantial discrepancy between the local WF values measured along the surface for small surface areas, 47,48 which is related to surface lateral heterogeneity. While such effects are interesting, the WF data of polycrystalline materials are more representative when measured for larger surface areas.…”
Section: Effect Of Local Sitementioning
confidence: 99%
“…Ismail et al have shown that WF is a local property of a specific surface site, which may change along the surface. Figure represents the image of the WF for InP showing that WF exhibits changes by ∼0.5 eV within a 1 mm distance.…”
Section: Photoelectrochemical Properties Of the Pt−tio2 Systemmentioning
confidence: 99%
“…These data indicate that the charge transfers within a photocatalytic system should satisfy the charge neutrality condition, which requires that cathodic and anodic currents must be identical.
36 Work function map for the surface of InP showing the areas of different work function values according to Ismail et al
37 Model of a micro-photoelectrochemical cell involving both cathodic and anodic sites: (a) TiO 2 -based cell involving Pt active sites (organic water solutes are represented by CH 3 OH), (b) general model representing the surface charge required for charge separation and the related charge transfer.
…”
Section: Photoelectrochemical Properties Of the Pt−tio2 Systemmentioning
confidence: 99%
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“…Appl. 24 (1989) [45][46][47][48][49][50] décennies, a permis une avancée importante dans la compréhension de l'interaction métal-semiconducteur, en particulier dans le cas des composés III-V. Ces matériaux, outre leur intérêt technologique lié à la largeur de leur bande interdite ou à leur mobilité, peuvent présenter une surface exempte d'état électronique dans la bande interdite : c'est la surface (110) obtenue par clivage [3][4][5]. Il a ainsi été démontré que l'interaction de ces surfaces avec un métal (ainsi d'ailleurs qu'avec des atomes non métalliques) produit, dès les premiers stades du dépôt, un ancrage du niveau de Fermi qui explique en grande partie la valeur de la barrière 4>B mesurée dans les diodes Schottky [6][7][8][9].…”
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