2014
DOI: 10.1016/j.microrel.2014.07.108
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A study of through package vias in a glass interposer for multifunctional and miniaturized systems

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Cited by 16 publications
(7 citation statements)
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“…Accordingly, the interposer architecture is demonstrated with silicon (Si) and a glass material system for the performance requirement of ultrafine pitch features. Glass-based interposers have been regarded as a superior alternative to Si-based interposer architecture because of their thermal and electrical properties and low cost [ 1 , 2 ]. Glass interposers are targeted to reduce the cost of high-density integration and compatibility with the large pan size (450–700 mm) procedure [ 1 ].…”
Section: Introductionmentioning
confidence: 99%
“…Accordingly, the interposer architecture is demonstrated with silicon (Si) and a glass material system for the performance requirement of ultrafine pitch features. Glass-based interposers have been regarded as a superior alternative to Si-based interposer architecture because of their thermal and electrical properties and low cost [ 1 , 2 ]. Glass interposers are targeted to reduce the cost of high-density integration and compatibility with the large pan size (450–700 mm) procedure [ 1 ].…”
Section: Introductionmentioning
confidence: 99%
“…Glass has relative superior electrical properties, a manageable coefficient of thermal expansion (CTE), low fabrication process cost, and prospective compatibility with next-generation panel fabrication processes [ 1 , 2 , 3 ]. Accordingly, glass-based interposers are regarded as the most promising material to replace the Si-based interposer technique; substantial literature has demonstrated the related technology, including the fabrication, thermal treatment, and metallization processes [ 4 , 5 , 6 , 7 , 8 ]. The embedded integrated circuit architecture with glass interposer has been demonstrated to meet the requirement of fine line/space and high-density interconnections [ 9 ].…”
Section: Introductionmentioning
confidence: 99%
“…In addition, some of challenges associated with the fabrication of glass interposers still exist, for instance, formation and metallization of TGV, compatibility issues relating to 2.5D/3D RF integration based on TGV interposer. The common fabrication methods for vias on glass substrates include wet etching, deep reactive-ion etching, sandblasting, laser ablation, the use of photosensitive glass, and the glass reflow process [13][14][15][16][17][18][19][20]. TGVs with 100 µm pitch and high aspect ratio are formed using a method called focused electrical discharging method in thick glass substrates, the method has achieved high throughput [14].…”
Section: Introductionmentioning
confidence: 99%
“…TGVs with 100 µm pitch and high aspect ratio are formed using a method called focused electrical discharging method in thick glass substrates, the method has achieved high throughput [14]. Studies have reported a pitch of 30 µm and a height of less than 200 µm for a TGV sample fabricated by laser drilling [1,[17][18][19][20]. A novel photosensitive glass, patterned by photolithography and followed by wet chemical etching process is reported, the TGVs with a diameter of 20 µm and a 4:1 aspect ratio is demonstrated [18].…”
Section: Introductionmentioning
confidence: 99%