A Study on Properties of Al:ZnO Thin Films by Used RTP Method

Abstract

Al:ZnO thin films were deposited using the radio frequency magnetron sputtering technique at various temperaturesand sputtering powers. With the increase in the deposition temperature and the decrease in the radio frequencysputtering power, the crystallinity was increased and the surface roughness was decreased, which lead to the decreasein the electrical resistivity of the film. It is also clearly observed that, the intensity of the (002) XRD peak increases withincreasing the substrate temperature [1,2]. The electrical resistivity and optical transmittance of the Al:ZnO thin filmwere analyzed as a function of the post-annealing temperature. It can be seen that with the annealing temperature setat 400℃, the resistivity decreases to a minimum value of 4.1×10-3 Ωcm and the transmittance increases to a maximumvalue of 85% of the Al:ZnO thin film

Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review

“…Effective light scattering not only enhances the current density of a-Si TFSCs but also saves cost by making thinner solar cells [26][27][28][29][30][31][32][33][34][35][36][37][38][39][40]. To obtain textured TCO surface morphologies, various strategies have been applied in the solar cell industry.…”