In recent times, transistors with heavily doped body have generated much interest because of junctionless channel. In addition, proper threshold voltage regulation requires adjustment of the channel doping, as a result of which most of the compact models become invalid as they consider an intrinsic body. In this paper, a compact surface-potential-based threshold voltage model is developed for short channel asymmetric double-gate metaloxide-semiconductor field-effect transistors with heavily/lightly doped channel. The 2-D surface potential is computed and compared with Technology Computer Aided Design, and a relative error of 2-4 % was obtained. The threshold voltage is solved from 2-D Poisson's equation using 'virtual cathode' method, and a good agreement is observed with the numerical simulations. Also, the model is compared with a reference model and a better result is obtained for heavily doped channel.