2005
DOI: 10.1002/smll.200500052
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A Tunnel Current in Self‐Assembled Monolayers of 3‐Mercaptopropyltrimethoxysilane

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Cited by 62 publications
(70 citation statements)
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“…The root-mean-square (rms) roughness of ITO glass derivatized with FPS measured using an Atomic Force Microscope (AFM) was identical to that of untreated ITO ( ∼ 3.5 nm), evidence that polymerization of FPS does not occur to any signifi cant extent using the vapor phase deposition method. This conclusion is in agreement with Aswal et al [ 34 ] and Stec et al [ 35 ] who used vapor phase deposition of trimethoxysilane nanolayers to immobilize incident Au atoms on silicon and glass substrates respectively, and is corroborated by the absence of ion fragments in the ule-SIMS spectra assigned to Si-O-Si linkages. Figure 1 (b) also shows evolution of the ϕ of UV/O 3 treated ITO glass as a function of time exposed to CPS vapor, from which it is evident that the optimal exposure time is also > 20 hrs and the ϕ of CPS derivatized ITO glass saturates at ∼ 5.25 eV.…”
Section: Electrode Fabrication and Characterizationsupporting
confidence: 86%
“…The root-mean-square (rms) roughness of ITO glass derivatized with FPS measured using an Atomic Force Microscope (AFM) was identical to that of untreated ITO ( ∼ 3.5 nm), evidence that polymerization of FPS does not occur to any signifi cant extent using the vapor phase deposition method. This conclusion is in agreement with Aswal et al [ 34 ] and Stec et al [ 35 ] who used vapor phase deposition of trimethoxysilane nanolayers to immobilize incident Au atoms on silicon and glass substrates respectively, and is corroborated by the absence of ion fragments in the ule-SIMS spectra assigned to Si-O-Si linkages. Figure 1 (b) also shows evolution of the ϕ of UV/O 3 treated ITO glass as a function of time exposed to CPS vapor, from which it is evident that the optimal exposure time is also > 20 hrs and the ϕ of CPS derivatized ITO glass saturates at ∼ 5.25 eV.…”
Section: Electrode Fabrication and Characterizationsupporting
confidence: 86%
“…With ellipsometry, the monolayer thickness has been determined as 0.8 0.1 nm with a roughness of 0.14 nm. 25 Our atomic force microscopy ͑AFM͒ measurements show a thickness of 6 nm with a roughness of 0.16 nm.…”
Section: Self-assembled Monolayer Preparationmentioning
confidence: 99%
“…They were cut into 13 mm × 13 mm squares and treated in a peroxide-ammonia solution to remove organic contaminations and to activate negative OH-groups on the surface [6]. Then a cationic polyelectrolyte polyethylenimine (PEI) was adsorbed under different conditions as it was described in [7], i.e.…”
Section: Methodsmentioning
confidence: 99%