2016
DOI: 10.1063/1.4972993
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A versatile UHV transport and measurement chamber for neutron reflectometry under UHV conditions

Abstract: We report on a versatile mini ultra high vacuum (UHV) chamber which is designed to be used on the MAgnetic Reflectometer with high Incident Angle (MARIA) of the Jülich Centre for Neutron Science at Heinz Maier-Leibnitz Zentrum in Garching, Germany. Samples are prepared in the adjacent thin film laboratory by molecular beam epitaxy and moved into the compact chamber for transfer without exposure to ambient air. The chamber is based on DN 40 CF flanges and equipped with sapphire view ports, a small getter pump a… Show more

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Cited by 9 publications
(2 citation statements)
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“…reflectivities were measured under ultra high vacuum (UHV) condition (Figure 8a) and in ambient air (Figure 8b) [58]. Magnetic and nuclear SLDs were obtained by fitting the measured data as shown in Figure 8c and d for PNR measured in UHV and in air, respectively.…”
Section: Depth Profiling In Thin Films and Multilayersmentioning
confidence: 99%
“…reflectivities were measured under ultra high vacuum (UHV) condition (Figure 8a) and in ambient air (Figure 8b) [58]. Magnetic and nuclear SLDs were obtained by fitting the measured data as shown in Figure 8c and d for PNR measured in UHV and in air, respectively.…”
Section: Depth Profiling In Thin Films and Multilayersmentioning
confidence: 99%
“…Hence, some approaches for in situ PNR exist: At the Jülich Centre for Neutron Science (JCNS) at the Heinz-Maier-Leibnitz Zentrum (MLZ) in Garching a molecular beam epitaxy (MBE) growth chamber was built that allows the transport of the produced sample from the dedicated laboratory to the neutron reflectometer MARIA using an evacuated transport chamber. This way the sample is not exposed to ambient conditions between deposition and measurement [8]. This approach allows one to specialize the deposition setup without compromising the task of thin film growth.…”
Section: Introductionmentioning
confidence: 99%