2020
DOI: 10.1134/s1063785020090023
|View full text |Cite
|
Sign up to set email alerts
|

A Vertical-Cavity Surface-Emitting Laser for the 1.55-μm Spectral Range with Tunnel Junction Based on n++-InGaAs/p++-InGaAs/p++-InAlGaAs Layers

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

0
9
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
6
2

Relationship

0
8

Authors

Journals

citations
Cited by 13 publications
(11 citation statements)
references
References 13 publications
0
9
0
Order By: Relevance
“…As a result, the total strain of the layers of the active region was ∼ 0.36% in relation to the InP substrate material. The lateral current and optical confinements were realized in within the BTJ concept [21] by formation in the composite In 0.53 Ga 0.47 As/In 0.53 Al 0.16 Ga 0.31 As of the tunnel junctions of small mesas of the diameter of 4−8 µm by chemical etching of the n ++ -and p ++ -In 0.53 Ga 0.47 As layers with subsequent epitaxial re-growth of the surface relief by the n-InP layer with the modulated doping profile [17]. The mesa etching depth was selected as a compromise between the high output optical power in the single-mode lasing and suppression of the effect of the saturating absorber in the non-pumped parts of the active region, which occurs in a relatively weak transverse optical confinement [22].…”
Section: Experimental Samplesmentioning
confidence: 99%
See 2 more Smart Citations
“…As a result, the total strain of the layers of the active region was ∼ 0.36% in relation to the InP substrate material. The lateral current and optical confinements were realized in within the BTJ concept [21] by formation in the composite In 0.53 Ga 0.47 As/In 0.53 Al 0.16 Ga 0.31 As of the tunnel junctions of small mesas of the diameter of 4−8 µm by chemical etching of the n ++ -and p ++ -In 0.53 Ga 0.47 As layers with subsequent epitaxial re-growth of the surface relief by the n-InP layer with the modulated doping profile [17]. The mesa etching depth was selected as a compromise between the high output optical power in the single-mode lasing and suppression of the effect of the saturating absorber in the non-pumped parts of the active region, which occurs in a relatively weak transverse optical confinement [22].…”
Section: Experimental Samplesmentioning
confidence: 99%
“…It should be noted that the epitaxial growth of the initial heterostructures of the optical resonator and the DBRs as well as the burial process have been implemented by the MBE method on the industrial unit Riber 49. Other details of the WF-VCSEL heterostructure design are given in the studies [17,22].…”
Section: Experimental Samplesmentioning
confidence: 99%
See 1 more Smart Citation
“…Long-wavelength vertical cavity surface-emitting lasers (VCSELs) are promising radiation sources for radiophotonics devices design, utilized in information-telecommunication and computer systems for high-speed data transmission, and are widely used in the quantum random number generators [1][2][3][4][5]. One of the factors explaining the VCSELs popularity in telecommunication devices is the rich variety of polarization phenomena (unstable polarization behavior), suitable for improving the randomness of generated bit sequences and increasing security for highspeed chaos multiplexing [6].…”
Section: Introductionmentioning
confidence: 99%
“…In the design of such VCSELs, the n + / p + -InAlGaAs TJ is widely used to reduce the level of optical losses, which makes it impossible to heal the surface relief formed in the TJ layers within the framework of the molecular-beam epitaxy technology. Relatively recently, we have shown the possibility in principle for effective application of the molecular beam epitaxy method at all stages of the epitaxial growth of long-wavelength VCSEL heterostructures [5]. In addition, effective WF-VCSELs in the 1.3 µm spectral range based on short-period superlattice of InGaAs/InGaAlAs were presented [6].…”
mentioning
confidence: 99%