2018
DOI: 10.1016/j.ceramint.2018.07.079
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A zeta potential and rheology study using electroacoustic spectroscopy on aqueous boron carbide suspensions

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Cited by 14 publications
(8 citation statements)
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“…[ 30 ] Protein research [ 25 ] explores the rheological behaviour of materials with this technique. [ 31,32 ]…”
Section: Descriptionmentioning
confidence: 99%
See 1 more Smart Citation
“…[ 30 ] Protein research [ 25 ] explores the rheological behaviour of materials with this technique. [ 31,32 ]…”
Section: Descriptionmentioning
confidence: 99%
“…[30] Protein research [25] explores the rheological behaviour of materials with this technique. [31,32] This paper concentrates on the electrophoretic light dispersion technique. In capillary cells, a laser beam passing through a sample charge the particle and they move at a frequency, f, depending on the laser wavelength, λ, and the scattering angle, θ:…”
Section: Introductionmentioning
confidence: 99%
“…Compared with control emulsion samples, the f-potential of HSE US , HSE LUHS29 , HSE LUHS183 , HSE LUHS210 and HSE LUHS245 samples was lower by 14.2%, 14.0%, 14.3%, 19.4% and 30.4%, respectively. f-potential allows determination of the electric charge distribution surrounding particles in a suspension (Dawes et al, 2018). High values of squared f-potential correlate directly to the magnitude of electrostatic repulsion, with values of f 2 greater than 625 mV 2 (f < À25 mV or f > 25 mV) generally being regarded as indicating high colloidal stability (Salopek et al,…”
Section: Stability Characteristics Of the Prepared Emulsionsmentioning
confidence: 99%
“…13 It can be seen from Figure 1b that the characteristic peak of SiO 2 (1050 cm −1 ) disappears after HF etching, indicating that SiO 2 on the surface of SiC powder reacts with HF. [20][21][22] It can be seen from the zeta potential analysis that the removal of impure ions by pickling and HF etching SiO 2 , followed by calcination to form a new SiO 2 layer, is advantageous for the dispersion of SiC particles. 18,19 It can be seen from Figure 2 SEM pictures that after 2.0% HCl washing (Figure 2A), 20% HF etching ( Figure 2B), and 750°C calcination treatment ( Figure 2C), the particle size and morphology of SiC powder did not change greatly, and all of them showed irregular sheet or block structure.…”
Section: Impure Ion Analysismentioning
confidence: 99%
“…The absolute value of zeta potential reached a maximum value of 75.1 mV at pH = 11.0, indicating that the powder was easily dispersed. [20][21][22] It can be seen from the zeta potential analysis that the removal of impure ions by pickling and HF etching SiO 2 , followed by calcination to form a new SiO 2 layer, is advantageous for the dispersion of SiC particles. Therefore, the influence of SiO 2 layer on the SiC surface was further studied by the rheology.…”
Section: Almentioning
confidence: 99%