2015
DOI: 10.1039/c4nj02289k
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AACVD of Cu2−xS, In2S3 and CuInS2 thin films from [Cu(iBu2PS2)(PPh3)2] and [In(iBu2PS2)3] as single source precursors

Abstract: PPh 3 ) 2 ] complexes have been synthesized and used as single source precursors to deposit thin films of cubic In 2 S 3 and Cu 2Àx S respectively on glass substrates by aerosolassisted chemical vapor deposition (AACVD) at 350-500 1C. Thin films of CuInS 2 have also been deposited by using 1 : 1 molar ratio of [In( i Bu 2 PS 2 ) 3 ] and [Cu( i Bu 2 PS 2 )(PPh 3 ) 2 ]. The deposited thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive X-ray diffracti… Show more

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Cited by 13 publications
(10 citation statements)
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“…80 The compounds [R 2 M(SeP i Pr 2 ) 2 N] (M = Ga, R = Me; M = In, R = Me, Et) were synthesised from the reaction of MR 3 with NH(SeP i Pr 2 ) 2 . 82 The air and moisture stable indium compound [In(S 2 P i Bu 2 ) 3 ] deposited thin films of cubic In 2 S 3 on glass substrates by AACVD at 350-500 1C. Similarly, thin films of hexagonal g-In 2 Se 3 were deposited from the methyl indium derivative.…”
Section: Groups 13 and 16 (Iii-vi) Thin Filmsmentioning
confidence: 99%
“…80 The compounds [R 2 M(SeP i Pr 2 ) 2 N] (M = Ga, R = Me; M = In, R = Me, Et) were synthesised from the reaction of MR 3 with NH(SeP i Pr 2 ) 2 . 82 The air and moisture stable indium compound [In(S 2 P i Bu 2 ) 3 ] deposited thin films of cubic In 2 S 3 on glass substrates by AACVD at 350-500 1C. Similarly, thin films of hexagonal g-In 2 Se 3 were deposited from the methyl indium derivative.…”
Section: Groups 13 and 16 (Iii-vi) Thin Filmsmentioning
confidence: 99%
“…This is versatile method because of its fast coating rate, wider choice and availability of the precursors, controlled films morphology and easy way to deposit thin films in short time period. 30 Herein, we report the fabrication of pure ZnO and Fe incorporated ZnO photoanodes via aerosol assisted chemical vapour deposition method for high performance photoelectrochemical water splitting. The ZnO thin films incorporated with different Fe concentrations (2%, 5%, 10% and 15%) have shown improved light absorption with expanding absorption range to visible range.…”
Section: Introductionmentioning
confidence: 99%
“…Thus, AACVD offers smart way to prepare high quality, uniform thin films in short-time. 35,36 In present work, Pristine ZnO and Co incorporated ZnO thin films were deposited on FTO substrates via aerosol assisted chemical vapour deposition technique at 400°C. The asdeposited thin films have been characterised by using wide range of characterization techniques.…”
Section: Introductionmentioning
confidence: 99%