2004
DOI: 10.1117/12.535288
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Aberration measurement and matching: a correlation of measurement techniques and dedication scheme implications

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“…Image placement error can be used as a metric for tool-to-tool matching in a process environment to minimize the intrafield overlay of different product layers. 10 The dependency of the image placement error on pattern, illumination type, and field position makes the error difficult to compensate. Moreover, layer-to-layer overlay corrections are often calculated after measuring typical barin-bar overlay patterns.…”
Section: Introductionmentioning
confidence: 99%
“…Image placement error can be used as a metric for tool-to-tool matching in a process environment to minimize the intrafield overlay of different product layers. 10 The dependency of the image placement error on pattern, illumination type, and field position makes the error difficult to compensate. Moreover, layer-to-layer overlay corrections are often calculated after measuring typical barin-bar overlay patterns.…”
Section: Introductionmentioning
confidence: 99%