2018
DOI: 10.1039/c8cp02289e
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Abnormal elastic modulus behavior in a crystalline–amorphous core–shell nanowire system

Abstract: We investigated the elastic modulus behavior of crystalline InAs/amorphous Al2O3 core-shell heterostructured nanowires with shell thicknesses varying between 10 and 90 nm by conducting in situ tensile tests inside a transmission electron microscope (TEM). Counterintuitively, the elastic modulus behaviors of InAs/Al2O3 core-shell nanowires differ greatly from those of bulk-scale composite materials, free from size effects. According to our results, the elastic modulus of InAs/Al2O3 core-shell nanowires increase… Show more

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Cited by 4 publications
(9 citation statements)
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“…Furthermore, the determined moduli have been found constant irrespective for the applied external load. A similar trend was also observed by Lee et al., who reported a slight increase in E shell at a shell thickness of about 40 nm followed by a drastic drop in E shell for larger shell thickness down to about 100 GPa for shell thicknesses between 50 and 90 nm …”
Section: Resultssupporting
confidence: 89%
See 1 more Smart Citation
“…Furthermore, the determined moduli have been found constant irrespective for the applied external load. A similar trend was also observed by Lee et al., who reported a slight increase in E shell at a shell thickness of about 40 nm followed by a drastic drop in E shell for larger shell thickness down to about 100 GPa for shell thicknesses between 50 and 90 nm …”
Section: Resultssupporting
confidence: 89%
“…As the experimental results in Figure a indicate, further investigation needs to be conducted, namely, an estimation of the effective Young’s modulus by finding the most suitable physical parameter for the Al 2 O 3 modulus. As discussed previously, Lee et al investigated InAs/Al 2 O 3 core–shell NWs and reported a change in the Young’s modulus of the Al 2 O 3 shell, E s , with thickness and determined that the Young’s modulus of the core, E c , did not vary with the diameter . Thus, a similar approach is assumed to be applied to the Nb 2 O 5 /Al 2 O 3 core–shell NWs in this work.…”
Section: Resultsmentioning
confidence: 83%
“…Silicon nitride (Si 3 N 4 ) is a widely applied semiconductor in electronic devices, integrated photonic devices, and micrometer/nanometer-scale electromechanical systems. As a traditional covalent ceramic, it possesses many intriguing properties, such as high strength, high hardness, high modulus, and high dielectric coefficient. , In the nanoscale form, Si 3 N 4 as a reinforced whisker can be used for the fabrication of the composite materials. , To further modify its mechanical properties, ion beam irradiation-induced composite structure represents one of the main strategies for material design and fabrication. Till now, many experimental studies of the mechanical properties of Si 3 N 4 NWs have been reported. Theoretically, failure mechanisms of Si 3 N 4 NW and mechanical properties of the core–shell materials have also investigated. However, due to the technical difficulties in deformation test by in situ electron microscopy, the tensile behavior of Si 3 N 4 NWs has not yet been evaluated, which hinders further elucidation of the deformation mechanisms of the nanoscale building blocks.…”
Section: Introductionmentioning
confidence: 50%
“…The microstructural properties of InAs NWs adopted in our experiments were described in detail in our previous study. 17 Based on the analyses of the selected area electron diffraction patterns and the results of the fast Fourier transform of HRTEM images, it was conrmed that the Al 2 O 3 thin shells were amorphous. The diameter of InAs NWs was in the range of several tens to several hundreds of nanometers, and it was also conrmed that InAs NWs were fully covered by the Al 2 O 3 shells.…”
Section: Methodsmentioning
confidence: 99%
“…The detailed ALD processes for Al 2 O 3 shells have been described elsewhere. 17 After the ALD process, the grid and heating device were placed on TEM holders for microstructural characterization and in situ heating TEM experiments. The in situ TEM experiments were conducted using a field-emission gun (FEG) transmission electron microscope operating at an accelerating voltage of 300 kV (FEI Tecnai F30 S-Twin, USA).…”
Section: Methodsmentioning
confidence: 99%