2015
DOI: 10.1016/j.jcrysgro.2014.09.049
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Abnormal InGaN growth behavior in indium-desorption regime in metalorganic chemical vapor deposition

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Cited by 24 publications
(12 citation statements)
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“…The In content and growth rate of the QW were in good accordance with those measured for a thicker ($45 nm) strained InGaN grown separately under the identical conditions as the QWs. 17 The MQW region was grown at a constant temperature of 733 C. After annealing to activate Mg in the p-type layers, the LED wafers were processed using a standard photolithography to fabricate 250 lm  400 lm chips. n-GaN was partly exposed by induction coupled plasma etching to make n-electrodes, while ITO was deposited on top of the p-type layer to make p-electrodes.…”
Section: Methodsmentioning
confidence: 99%
“…The In content and growth rate of the QW were in good accordance with those measured for a thicker ($45 nm) strained InGaN grown separately under the identical conditions as the QWs. 17 The MQW region was grown at a constant temperature of 733 C. After annealing to activate Mg in the p-type layers, the LED wafers were processed using a standard photolithography to fabricate 250 lm  400 lm chips. n-GaN was partly exposed by induction coupled plasma etching to make n-electrodes, while ITO was deposited on top of the p-type layer to make p-electrodes.…”
Section: Methodsmentioning
confidence: 99%
“…As shown in Fig. 2(c), when the InGaN growth rate increases to 0.0182 nm/s (corresponding to Sample S35), a large number of pits and black spots appear on the surface, caused by reduced migration time of adatoms on the growth surface with a larger InGaN growth rate [16]. The rough surface may be accompanied with a degraded material quality related to defects, which can form a large number of non-radiative recombination centers.…”
Section: Resultsmentioning
confidence: 96%
“…The possible reason for the degraded material quality is that the longer growth time gives impurity atoms in the reaction chamber more opportunity to be introduced into epitaxial layers. However, it is also well known that the PL intensity of InGaN is affected not only by the non-radiative centers dependent on the material quality [15,16], but also by the localization states which form the radiative recombination centers [7e9]. We will investigate this aspect below.…”
Section: Resultsmentioning
confidence: 99%
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“…The indium composition can vary due to growth temperature fluctuation of the substrate surface during MOCVD growth. Moreover, it has been reported that in close coupled showerhead reactors, the growth rate of GaN in InGaN layers can be enhanced by increasing TMIn flow [14], which makes the determination of InGaN composition and thickness much complex. This enhanced growth rate determined experimentally was taken into consideration in the HR-XRD fitting to accurately determine the thickness and composition of each sample.…”
Section: Methodsmentioning
confidence: 99%