Abstract: Intense field-emission ion source of liquid metals

Abstract

Articles you may be interested inField-emission processes from a liquid-metal surface J. Vac. Sci. Technol. B 15, 410 (1997); 10.1116/1.589328 Gallium liquid metal ion source (abstract) Rev. Sci. Instrum. 65, 1355 (1994); Summary Abstract: Ion cluster emission and deposition from liquid metal ion sources J. Vac. Sci. Technol. B 3, 457 (1985); 10.1116/1.583286 Fieldemission liquidmetal ion source and triode ion gun

Application of Ion Beam Processes to Scanning Probe Microscopy

“…There were several important advancements which enabled the field of FIB processing to emerge, one of which is the development of the liquid metal ion source (LMIS) [6][7][8]. These consist of a tungsten tip (with end diameter as small as 5 nm) and a reservoir of liquid metal (usually Ga) which wets the tip with a thin metallic film.…”

Scanning ion beam lithography and its application in microelectronics and microscopy

“…The invention of the liquid-metal field-ion source (Clampitt et al, 1975) created an opportunity to develop a number of applications of focused ion beams that hitherto either were impracticable or were impossible to conceive. The reason for this re-awakening of interest in focused ion beams comes simply from the fact that the new ion source is about three orders of magnitude brighter than well-established gaseous ion sources such as the duoplasmatron (Broers, 1472).…”

“…The radius of the cone apex is so small that the electric field is locally enhanced to an extent that field emission of ions can occur. Early ion sources based on this principle used liquid metal contained in a capillary tube (Mohoney et al, 1969), but the normal embodiment is now the solid-needle form of field-emission ion source that was first adopted at the Culham Laboratory (Clampitt et al, 1975). In this configuration, shown in Fig.…”

Repair Of Photomasks With Focussed Ion Beams

“…Considerable effort has already been expended to make and inspect the mask, so the value added by the repair process is high. Ion beam photomask repair has significant advantages over existing techniques such as laser repair: (1) Ion beams can be focussed to diameters of 0.lpm or less. Furthermore, since the ion beam is used to remove material by sputtering rather than by vaporization, any material can be removed and the removal area is directly controlled by the beam position and profile.…”

“…Beverly, MA 01915 INTRODiJÇTION The development of high -brightness liquid metal ion sources [1] has made it possible to produce focussed ion beams with submicrometer dimensions and moderate current density (about 1 A/an2).…”