Moving
meniscus-assisted vertical lifting is a commonly
employed
particle assembly technique to realize large-area particle patterning
for the easy fabrication of colloidal photonic crystals and sensors.
Though great success has been achieved for large-area patterning,
inscribing desired patterns over the target substrate with precise
control over the morphology remains a challenge. The target substrates
need to be functionalized (physically or chemically) to realize desired
patterns, which increases the complexity and limits their applicability
to specific particle–liquid combinations. We demonstrate a
new approach for the precise patterning of gold nanoparticles (Au
NPs, diameter ∼60 nm) over solid substrates by the synergy
of light-induced Marangoni flow and vertical lifting process (moving
meniscus), without the requirement of photomasks or templates. The
core idea relies on the particle accumulation due to light-induced
Marangoni flow near the liquid meniscus in contact with a solid surface
(due to plasmonic absorption of the particles) and the controlled
lifting of the substrate. We present both the simulation and experimental
results of the developed patterning technique. Various patterns such
as continuous lines, intermittent lines with varying lengths, patterns
with continuously varying widths, cross patterns, etc. are successfully
inscribed. Dynamic control over the three-dimensional morphology of
the deposited patterns is achieved by varying the lifting velocity,
laser irradiation time, and lifting direction during the inscription
process. Finally, we show the applicability of the developed plasmonically
active surface for the large-area parallel manipulation of nonabsorbing
microparticles based on optothermoconvective flow. The major advantage
of the developed method compared to the existing light-controlled
patterning techniques is its ability to inscribe patterns over large
distances (up to several centimeters). We expect that the results
presented in this paper will benefit different applications requiring
precise particle patterning, such as optical elements, sensors, plasmonic
substrates, microfluidic master templates, and electronic circuits.