2003
DOI: 10.1149/1.1553936
|View full text |Cite
|
Sign up to set email alerts
|

Accelerator Aging Effects During Copper Electrodeposition

Abstract: Slow sweep rate voltammetric analysis of the Cu/Cu͑II͒ deposition reaction is shown to be an effective tool for examining aging effects associated with thiol and disulfide additives that are widely employed as brighteners. Sulfonate-terminated short chain thiols are spontaneously oxidized by Cu͑II͒ to form disulfide molecules with the conversion being complete within a few hours of electrolyte preparation. An additional aging effect occurs during electrolysis in conventional unseparated electrochemical cells. … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

2
106
0

Year Published

2006
2006
2022
2022

Publication Types

Select...
7
2

Relationship

0
9

Authors

Journals

citations
Cited by 69 publications
(108 citation statements)
references
References 12 publications
2
106
0
Order By: Relevance
“…As with enzymes, adsorbed ligands may also influence the behavior of electrodes through both passive (e.g. selective adsorption) 14 33 and dithiocarbamates 34 have also been used to stabilize Au nanoparticles. In contrast with gas phase heterogeneous catalysis where sulfur species are generally considered poisons, these thiol-protected Au nanoclusters are particularly interesting candidates as electrocatalysts, 35,36 especially considering their unique electronic states resembling molecules rather than a metals.…”
mentioning
confidence: 99%
“…As with enzymes, adsorbed ligands may also influence the behavior of electrodes through both passive (e.g. selective adsorption) 14 33 and dithiocarbamates 34 have also been used to stabilize Au nanoparticles. In contrast with gas phase heterogeneous catalysis where sulfur species are generally considered poisons, these thiol-protected Au nanoclusters are particularly interesting candidates as electrocatalysts, 35,36 especially considering their unique electronic states resembling molecules rather than a metals.…”
mentioning
confidence: 99%
“…[1][2][3] Tremendous efforts were taken to characterize chemical reactions on copper surfaces. [4][5][6][7] The results answer fundamental questions about reaction paths of the stepwise copper ion reduction and they explain the chemical behavior of various additive molecules. [8][9][10][11][12][13] However, the applicability to real copper plating processes and the phenomenon of superfilling is limited.…”
mentioning
confidence: 75%
“…27 Recently, attempts were made to attribute the increased deposition rate and the current density to the competitively adsorbed SPS from the viewpoint of the chemical reactions between the Cu ions and SPS or its reduced form ͑MPSA͒. [7][8][9][10] There is a need to pay attention to the fact that the current density recovered by SPS re-decreased by BTA addition. The current density in the presence of BTA was even lower than that of PEG-Cl − within the potential range of 0 to −400 mV.…”
Section: Resultsmentioning
confidence: 99%
“…[7][8][9][10] The accumulation of the accelerator inside the pattern brought about a locally higher concentration even after the complete filling of the pattern, which caused the topographic reversal ͑formation of bumps͒ and step formation at the densely patterned area. The step height generated by overdeposition at the active area had a strong relation to the dimension and the density of the patterns.…”
mentioning
confidence: 99%