Thin-film deposition using electrodeposition techniques is highly preferable because of its capability to deposit multi-component alloys at low temperatures. In this regard, copper bismuth selenide (CBSe) films were electrodeposited in two various ways, simultaneous and successive electrodeposition processes. The structural and morphological characterizations of the obtained films were performed using X-ray diffraction (XRD), scanning electron microscope (SEM), energy-dispersive X-ray analysis (EDX), and X-ray Photoelectron Spectrometer (XPS). The CBSe alloy films formed by successive electrodeposition revealed better crystallinity and more regular morphology in comparison with simultaneous electrodeposited CBSe films. The prepared CBSe film by successive electrodeposition exhibited high light absorptivity and low band gap energy value (Eg = 1.65 eV) resulting in a higher photoelectrical response. The crystallization of the ternary CBSe film electrodeposited via successive routine obeyed the instantaneous nucleation mechanism, while the CBSe film obtained by simultaneous electrodeposition agreed with the progressive nucleation mechanism. Successive electrodeposition of ternary CBSe alloy film achieved greater values of photocurrent–voltage conversion efficiency (η = 1.26%) in photoelectrochemical systems.
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