Accurate Ion Energy Control in Plasma Processing by Switched-Mode Power Converter

Abstract

published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research. • You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the "Taverne" license above, please follow below link for the End User

Auto-Tuning Control of a Switched-Mode Power Converter for Tailored Pulse-Shape Biased Plasma Etching Applications

“…The optimal operating point found by the manual-tuning and auto-tuning is close, which demonstrate the correctness of the proposed method. The proposed auto-tuning control method has been patented [23].…”

Equivalent electric circuit model of accurate ion energy control with tailored waveform biasing

“…Although some reactor models have been derived in previous research, most of them are used for RF biasing [9,25,32,[37][38][39] or are a steady-state simplification of tailored waveform biasing [36,40,41]. These models cannot be directly used for transient analysis in tailored waveform biasing because the discharge process is not accurately included.…”