2016
DOI: 10.1021/acsami.6b00499
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Additive Fabrication of Conductive Patterns by a Template Transfer Process Based on Benzotriazole Adsorption As a Separation Layer

Abstract: The traditional subtractive process to fabricate conductive patterns is environmentally harmful, wasteful, and limited in line width. The additive process, including direct printing of conductive paste or ink, direct printing of catalytic ink, laser-induced forward transfer, etc., can solve these problems. However, the current additive process also faces many difficulties such as low electrical and adhesion properties, low pattern thickness, high cost, etc. Benzotriazole (BTA), as widely used corrosion inhibit… Show more

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Cited by 9 publications
(7 citation statements)
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“…R e represents the impendence of the electrolyte. Q 1 represents the capacitive behavior of the epitaxial layer on the carrier copper (mainly affected by the interfacial capacitance of the copper/oxide layer), and R 1 represents the resistive behavior of the oxide layer …”
Section: Resultsmentioning
confidence: 99%
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“…R e represents the impendence of the electrolyte. Q 1 represents the capacitive behavior of the epitaxial layer on the carrier copper (mainly affected by the interfacial capacitance of the copper/oxide layer), and R 1 represents the resistive behavior of the oxide layer …”
Section: Resultsmentioning
confidence: 99%
“…Q 1 represents the capacitive behavior of the epitaxial layer on the carrier copper (mainly affected by the interfacial capacitance of the copper/ oxide layer), and R 1 represents the resistive behavior of the oxide layer. 42 Q 2 represents the capacitive behavior of the electrical double layer at the oxide/electrolyte interface with the PDMS nanolayer as the dielectric, and R 2 represents its resistive behavior. Since the anti-adhesion film mainly affects the electrical behavior of the oxide/electrolyte interface, its capacitance (C) can be calculated from Q 2 and R 2 by 57 As a result, the thickness (d) of the antiadhesion film can be obtained from the parallel capacitor equation d = ε 0 εS/C, in which ε 0 represents a vacuum dielectric constant of 8.85 × 10 −14 F/cm, S represents the surface area of anti-adhesion film, and ε represents the relative permittivity of the anti-adhesion film, which was also measured via the EIS test and calculated to be 53.75, as shown in Figure S4.…”
Section: Resultsmentioning
confidence: 99%
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“…Functionalizing the donor surfaces with adhesion reduction layers cannot resist to high temperature process, for the coating material is organic. [32] As there is no heterogeneous material access in the transfer process, the method of stress inducing delamination is simple, nondestructive, and compatible with high temperature techniques, which is rather suitable for the transfer of The flexible electrodes with excellent electrical and mechanical performance play critical and fundamental roles in the wearable electronics. In this work, highly conductive and fatigue-free flexible copper thin-film electrodes on polyethylene terephthalate substrate are successfully fabricated by a facile, nondestructive, and heat-resistant dry transfer technique.…”
Section: Highly Conductive and Fatigue-free Flexible Copper Film Elecmentioning
confidence: 99%
“…Fabrication of metallic nanomaterial patterns is very important in the electronic industry . A variety of techniques for producing these metallic nanoparticle patterns have been developed, such as ink‐jet printing, direct writing, electroplating, screen printing, and soft lithography including micro‐contact printing (μCP) and nanoimprint lithography (NIL) . Nevertheless, adapting a fair number of techniques to industrial uses is difficult due to the relatively complicated processes and/or the expensive installations.…”
mentioning
confidence: 99%