2017
DOI: 10.1016/j.micromeso.2017.05.052
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Adsorptive desulfurization of fuels with Cu(I)/SBA-15 via low-temperature reduction

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Cited by 32 publications
(20 citation statements)
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“…The distinct peaks at 932 and 952 eV are ascribed to Cu 2p 3/2 + and Cu 2p 1/2 + , respectively. The peaks at 934 and 954 eV confirm the presence of Cu(II) species, probably arising from oxidation of Cu + during catalyst preparation . The XPS atomic percentages (N, 2.3%; Cu, 1.1%) show that the atomic ratio of nitrogen to copper is about 2 in ECS‐SB‐CuBr, proving that one copper atom coordinates with two nitrogen atoms in the ECS‐SB‐CuBr catalyst.…”
Section: Resultsmentioning
confidence: 99%
“…The distinct peaks at 932 and 952 eV are ascribed to Cu 2p 3/2 + and Cu 2p 1/2 + , respectively. The peaks at 934 and 954 eV confirm the presence of Cu(II) species, probably arising from oxidation of Cu + during catalyst preparation . The XPS atomic percentages (N, 2.3%; Cu, 1.1%) show that the atomic ratio of nitrogen to copper is about 2 in ECS‐SB‐CuBr, proving that one copper atom coordinates with two nitrogen atoms in the ECS‐SB‐CuBr catalyst.…”
Section: Resultsmentioning
confidence: 99%
“…Contributing to this distinction in the bond strength, CO can be readily separated from gas mixtures. , It is known that the efficiency of the π-complexation adsorption is mainly dependent on the structural property of adsorbents. , With regard to the fabrication of Cu­(I) π-complexation adsorbents, bulk cuprous chemicals usually show a low efficiency. In order to create a great number of exposed active sites, a general approach is to load Cu­(I) on porous materials with a large surface area, for example, zeolites, mesoporous silica materials, , and metal–organic frameworks (MOFs). Notably, direct incorporation of Cu­(I) on porous materials needs an elaborative operation under an inert atmosphere, for the reason that the Cu­(I) sites can be easily oxidized, and then will lose its reactivity. Thus, a two-step process is preferable via (i) introduction of Cu­(II) onto the porous materials, such as active carbon, , zeolites, , and mesoporous silica materials, and (ii) reduction of Cu­(II) to active Cu­(I) sites.…”
Section: Introductionmentioning
confidence: 99%
“…17,18 With regard to the fabrication of Cu(I) π-complexation adsorbents, bulk cuprous chemicals usually show a low efficiency. In order to create a great number of exposed active sites, a general approach is to load Cu(I) on porous materials with a large surface area, for example, zeolites, 19−21 mesoporous silica materials, 22,23 and metal−organic frameworks (MOFs). 24 Notably, direct incorporation of Cu(I) on porous materials needs an elaborative operation under an inert atmosphere, for the reason that the Cu(I) sites can be easily oxidized, and then will lose its reactivity.…”
Section: ■ Introductionmentioning
confidence: 99%
“…So, fortunately, the regeneration performance of adsorbents via π-complexation is superior to those of chemical adsorbents, and π-complexation adsorbents have higher adsorption capacity in desulfurization than physical adsorbents. Recently, much research has been reported that Cu + and Ag + dispersed on different supports such as zeolites, , alumina, and carbon are efficient in adsorptive desulfurization because of the π-complexation.…”
Section: Introductionmentioning
confidence: 99%
“…So, fortunately, the regeneration performance of adsorbents via πcomplexation is superior to those of chemical adsorbents, and π-complexation adsorbents have higher adsorption capacity in desulfurization than physical adsorbents. Recently, much research has been reported that Cu + and Ag + dispersed on different supports such as zeolites, [8][9][10][11]35 alumina, 12 and carbon 15−21 46 The MOF (denoted as Cu-BTC-DMA here) shows a cubic structure with a chloride-centered square-planar [Cu 4 Cl] 7+ cluster linked with the 1,3,5-benzenetricarboxylate ligands. A three-dimensional anionic (3D) framework is present with the permanent porosity compensated by (CH 3 ) 2 NH 2 + cation for charge balance.…”
Section: Introductionmentioning
confidence: 99%