2018
DOI: 10.1016/j.cej.2017.10.155
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Adsorptive separation of xenon/krypton mixtures using ligand controls in a zirconium-based metal-organic framework

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Cited by 65 publications
(25 citation statements)
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“…For example, MOFs with high surface area (e.g., IRMOFs, UiO-66) and polar functional groups (e.g., IRMOF-X, UiO-66-X, X = Cl, F, Br, I, NH 2 , etc.) have shown high Xe uptake, but weak gas–adsorbent interactions in these cases have resulted in low gas selectivity. Additionally, MOFs with accessible, highly polarizable open metal sites (e.g., MOF-74 series, HKUST) have also been evaluated for noble gas separation because of their stronger affinity to Xe than Kr. , A number of reports suggest that optimal pore size comparable to the kinetic diameter of Xe is a key factor for high capacity and selectivity. Among many MOF materials tested for Xe/Kr separation, ,,, the highest Xe/Kr selectivity has been achieved recently by CROFOUR-1-Ni systems, reaching a value of 22 at 1.0 bar and 298 K …”
Section: Introductionmentioning
confidence: 99%
“…For example, MOFs with high surface area (e.g., IRMOFs, UiO-66) and polar functional groups (e.g., IRMOF-X, UiO-66-X, X = Cl, F, Br, I, NH 2 , etc.) have shown high Xe uptake, but weak gas–adsorbent interactions in these cases have resulted in low gas selectivity. Additionally, MOFs with accessible, highly polarizable open metal sites (e.g., MOF-74 series, HKUST) have also been evaluated for noble gas separation because of their stronger affinity to Xe than Kr. , A number of reports suggest that optimal pore size comparable to the kinetic diameter of Xe is a key factor for high capacity and selectivity. Among many MOF materials tested for Xe/Kr separation, ,,, the highest Xe/Kr selectivity has been achieved recently by CROFOUR-1-Ni systems, reaching a value of 22 at 1.0 bar and 298 K …”
Section: Introductionmentioning
confidence: 99%
“…Previously Meek et al demonstrated that the IRMOF-2-X series had increased selectivities for the more polarizable monohalogenated linkers . For UiO-type MOFs, Lee et al found that the more donating groups on the linker, the greater the selectivity, while electron-withdrawing groups lower the selectivity . The MOFs studied herein do not follow either of these trends, suggesting that the electronic effects are negligible at these pore size ranges, and the variation in the thermodynamic selectivities only ranges from 4.00 (UiO-68-TMS 2 ) to 4.96 (UiO-68-F 4 ).…”
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confidence: 62%
“…An alternative approach is to take advantage of the differences in the electronic properties of the gases, such as exploiting their difference in polarizability (Figure a), to favor interaction of one gas with the MOF more than with the other. This idea takes advantage of the “heavy atom effect,” where highly polarizable groups interact preferentially with larger atoms (resembling soft–soft interactions). The only two systematic studies that address these electronic interactions were performed on monohalogenated derivatives of IRMOF-1 (Zn-based) , and functionalized derivatives of UiO-66 (Zr-based) . The IRMOF-1 study showed that, by including highly polarizable iodine as part of the terephthalate link, higher selectivities were achieved than when functionalizing with Br, Cl, or F, and the UiO-66 study showed a positive correlation between Xe/Kr selectivity and polarized ligands.…”
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confidence: 99%
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“…The interaction between Xe and frameworks can be further enhanced by depositing Ag nanoparticles in Ni-MOF-74 with increased Xe capacity by 15.6% 19 . The study on the Xe/Kr separation performances of a series of functionalized UiO-66 materials synthesized by introducing several polar functional groups (-F, -NH 2 , -OMe) revealed that UiO-66-NH 2 (OMe) 2 with the highest electron density exhibited the best Xe/Kr separation performances 20 . The selectivity for Xe/Kr separation of SBMOF-2 and [Co 3 (C 4 O 4 ) 2 (OH) 2 ]•3H 2 O was up to 10 and 69.7 respectively, which was benefited from their suitable pore size and pore surfaces decorated with polar hydroxyl groups 21,17 .…”
Section: Introductionmentioning
confidence: 99%