“…Silicon-based thin films, such as silica and silicon carbide (SiC), and oxycarbide, are useful in a variety of applications due to their versatile physicochemical properties, chemical and thermal stability, and structural stability. [2][3][4] These organosilicon thin films have been used as di-electric materials, [5][6][7] antireflective coatings, 8,9 anti-fouling layers, 10,11 and in molecular separations, 12,13 amongst other applications. There are several different techniques for depositing such films on substrates, including spin-coating, 14 dip-coating, 15,16 and chemical vapor deposition (CVD).…”