Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures

Marty, F.; Rousseau, Lionel; Saadany, Bassam; Mercier, Bruno; Français, Olivier; Mita, Yoshio; Bourouina, Tarik

doi:10.1016/j.mejo.2005.04.039

Cited by 272 publications

(150 citation statements)

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“…Current methods used to produce X-ray diffractive optics include top-down methods involving patterning of a thick resist mould 6,7 , pattern transfer into a substrate using deep reactive ion etching [8][9][10] , anisotropic Si wet etch 11,12 , multiple patterning techniques 13 , multilayer Laue lens, various multilayer-sliced zone plate techniques 14 , lithographic stacking 15 and mechanical stacking 16 . Advantages and tradeoffs exist with each method.…”

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confidence: 99%

Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics

2014

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Although diffractive optics have played a major role in nanoscale soft X-ray imaging, highresolution and high-efficiency diffractive optics have largely been unavailable for hard X-rays where many scientific, technological and biomedical applications exist. This is owing to the long-standing challenge of fabricating ultra-high aspect ratio high-resolution dense nanostructures. Here we report significant progress in ultra-high aspect ratio nanofabrication of high-resolution, dense silicon nanostructures using vertical directionality controlled metalassisted chemical etching. The resulting structures have very smooth sidewalls and can be used to pattern arbitrary features, not limited to linear or circular. We focus on the application of X-ray zone plate fabrication for high-efficiency, high-resolution diffractive optics, and demonstrate the process with linear, circular, and spiral zone plates. X-ray measurements demonstrate high efficiency in the critical outer layers. This method has broad applications including patterning for thermoelectric materials, battery anodes and sensors among others.

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confidence: 99%

Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics

2014

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“…An additional advantage of AMCPs is that channel micromachining is performed using deep reactive ion etching (DRIE), which allows the channel geometry to be fully customized and adapted to the readout electronics. The combination of photolithography and DRIE can provide aspect ratios comparable to lead-glass MCPs [100].…”

Section: Amcp Conceptmentioning

confidence: 99%

Review of amorphous silicon based particle detectors: the quest for single particle detection

Wyrsch

Ballif

2016

Semicond. Sci. Technol.

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Abstract. Hydrogenated amorphous silicon (a-Si:H) is attractive for radiation detectors because of its radiation resistance and processability over large areas and with mature Si microfabrication techniques. While the use of a-Si:H for medical imaging has been very successful, the development of detectors for particle tracking and minimum-ionizing-particle detection has lagged, with almost no practical implementation. This paper reviews the development of various types of a-Si:H-based detectors and discusses their respective achievements and limitations. It also presents more recent developments of detectors that could potentially achieve single particle detection and be integrated in a monolithic fashion into a variety of applications.

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“…In the next step, metal is deposited on the backside of the wafer where it is patterned by the backside layout mask and then etched. We turn again to the front side to make Deep Reactive Ion etching (DRIE) for the silicon structure layer [Marty et al 2005]. At that level, both the oxide and the aluminum serve as mask materials for silicon etching by DRIE.…”

Section: Q = 662mentioning

confidence: 99%

MEMS based deep 1D photonic crystal

Malak¹,

Bourouina²

2012

Photonic Crystals - Introduction, Applications and Theory

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Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures

Cited by 272 publications

References 4 publications

Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics

Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics

Review of amorphous silicon based particle detectors: the quest for single particle detection

MEMS based deep 1D photonic crystal

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