2006
DOI: 10.1016/j.tsf.2005.07.227
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Advanced generation of rotatable magnetron technology for high performance reactive sputtering

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Cited by 7 publications
(3 citation statements)
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“…As the target is sputtered, its characteristics also change, so the deposition conditions such as the layer thickness and the film morphology are expected to change during the lifetime of the target [142]. To overcome this hurdle, moving targets/magnet systems have been developed, with almost 80% usage for flat targets [150], and more than 90% in cylindrical rotating targets [151].…”
Section: 2 Reactive Magnetron Sputtering Depositionmentioning
confidence: 99%
“…As the target is sputtered, its characteristics also change, so the deposition conditions such as the layer thickness and the film morphology are expected to change during the lifetime of the target [142]. To overcome this hurdle, moving targets/magnet systems have been developed, with almost 80% usage for flat targets [150], and more than 90% in cylindrical rotating targets [151].…”
Section: 2 Reactive Magnetron Sputtering Depositionmentioning
confidence: 99%
“…The use of precision impedance analyzer Magnetron Sputtering Ni film volume resistivity, volume resistivity curves of different optical attenuator polishing time, Characterization binding force between the film and the Ni sputtering SiO2 substrate strength [11], Figure 5. As can be seen from Figure 5, a lot of small sample volume resistivity than silica glass, good electrical properties, proved that after polishing, the Ni film did not fall off, and the polishing time increases, the volume resistivity of the less volatile sample , indicating a strong binding force between the magnetron sputtering method to obtain an Ni film and the substrate, and the rub resistance of the Ni film is relatively good.…”
Section: Ni Film and The Substrate Binding Analysismentioning
confidence: 99%
“…Although low cost indium free TCO electrodes, such as Al-doped ZnO (AZO) and Ga-doped ZnO (GZO) films grown by batch-type magnetron sputtering, have been suggested as potential low cost anode materials for OSCs, their low power conversion efficiency (PCE), severe reaction with acidic PEDOT : PSS solution and low efficiency of the conventional sputtering process still remain as drawbacks [3][4][5][6]. Recently, cylindrical rotating magnetron sputtering (CRMS) has attracted a great deal of attention as a costefficient sputtering technique for photovoltaics, due to its high target usage of more than 80%, process stability and enhanced process efficiency [7,8]. However, there have been few studies on investigation of the preparation of AZO electrodes by the CRMS and the fabrication of OSCs on the CRMS-grown AZO electrodes, which would be beneficial for the low-cost production of OSCs.…”
Section: Introductionmentioning
confidence: 99%