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Films ofZnOI Ag/Sn/ZnO deposited by dc magnetron sputtering are being widely used as "heat mirror" films in architectural applications. The long-term durability of these films has been studied through accelerated weathering and exposure to controlled atmospheres ofC1 2 , H 2 S, and moisture. After accelerated exposure, films were analyzed by ultraviolet-visible-near infrared . and far infrared spectroscopy, Auger depth profiling, and scanning electron microscopy. No significant changes were seen in transmittance or infrared reflectivity. No interdiffusion oflayers was seen in Auger profiling.

Reactive ion sputtering ( N : ) is shown to improve depth resolution significantly in conventional Auger electron spectroscopy depth profiling of multilayered metallic thin film samples as compared to standard argon ion bombardment. Layer modulations on the order of the escape depth of the Auger electrons are shown to be discernible by conventional Auger depth profiling in a texturing-prone situation (microscopically modulated thin film samples) when N : is used as the sputtering species. Oxygen ion sputtering was observed to give greater improvement in depth resolution than nitrogen, but was also observed to have a deleterious influence on instrument performance. Increasing the N : ion energy from 2 to 5 keV was found to degrade depth resolution slightly.