Advanced lift-off planarization process for Josephson integrated circuits

Ishida, I.; Tahara, Syuichi; Wada, Yoshifusa

doi:10.1063/1.99906

Cited by 4 publications

(2 citation statements)

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“…The procedure left a residue at each edge of the electrode, increasing the surface roughness after cleaning by ultrasound and spinning. The problem of PR attaching to a sidewall can be solved by a special PR technique to enlarge the bottom space of the PR pattern after etching [13]. This special method uses a PR with an inclined wall (or multi-layered step) to enlarge the bottom space.…”

Section: Evaluation Of the Proposed Planarization Methodsmentioning

confidence: 99%

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Improvement of High Dynamic Range Capacitive Displacement Sensor by a Globalm Planarization

Kang¹,

Moon²

2011

JST

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This study presents an improvement of high dynamic range contact-type capacitive displacement sensor by applying planarization. The sensor is called the contact-type linear encoder-like capacitive displacement sensor (CLECDiS), is a nano-meter-resolution sensor with a wide dynamic range. However, height differences due to patterned electrodes may cause a variety of problems or performance degradation. In devices of two glass wafer surfaces with patterned structures assembled face-to-face and in sliding contact, the heights of the patterns crucially affect their performance and practicality, so it should be planarized for reducing the problem. A number of techniques for planarizing glass wafer surfaces with patterned chrome electrodes were evaluated and the following three were selected as adequate: lift-off, etch-back, and chemical mechanical polishing (CMP). The fabricated samples showed that CMP provided the best planarization. CMP was successfully employed to produce CLECDiS with improved signal reliability due to reduced collisions between electrodes

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Section: Evaluation Of the Proposed Planarization Methodsmentioning

confidence: 99%

“…Lift-off is a well-known micromachining technique used for patterning [13]. A normal lift-off process is shown in Figure 3(a).…”

Section: Lift-offmentioning

confidence: 99%