Advanced lithographic filtration and contamination control for 14nm node and beyond semiconductor processes

Metal Ions Removal from Organic Solvents using MXene-Based Membranes

“…Among the metal ions studied, ions such as Na, K, Fe, and Ni are mostly encountered in the solvents used in the microelectronics industry and their removal is challenging. 6 As shown in Figure 2A, the metal ions such as Fe and Ni ions were removed more efficiently compared with monovalent ions such as K and Na ions. The higher removal efficiency of Fe and Ni ions can be attributed to the higher electrostatic attraction between MXene and divalent/multivalent ions compared to monovalent ions.…”

“…4,5 Although most particles can be removed by a sieving mechanism using nanofiltration membranes, the removal of trace amounts of metal ions is challenging. 6 For instance, metal ions such as Fe, Cu, Ni, Cr, Co, Pt, and Ir dissolve in the Si matrix and/or form silicide, causing p−n junction leakage. 7 Additionally, Cr contamination results in reliability degradation of the gate dielectric.…”

“…The constant advancement in the microelectronics (semiconductor) industry has led to the economically feasible micro- and nanofabrication of integrated circuits (ICs) . In the process of miniaturization of ICs, quality control is very stringent for the processing fluids; even part per billion (ppb) contaminants can lead to the failure of devices. , The main defects caused by solvents and materials used in chip manufacturing are particles and metal ions. , Although most particles can be removed by a sieving mechanism using nanofiltration membranes, the removal of trace amounts of metal ions is challenging . For instance, metal ions such as Fe, Cu, Ni, Cr, Co, Pt, and Ir dissolve in the Si matrix and/or form silicide, causing p–n junction leakage .…”

“…The metal ions such as Li, Mg, Ca, Cr, Fe, Ni, Cu, Mn, and Co were removed above 90%, and metal removal efficiencies of above 80% were achieved for Al, V, and Pb ions. Among the metal ions studied, ions such as Na, K, Fe, and Ni are mostly encountered in the solvents used in the microelectronics industry and their removal is challenging . As shown in Figure A, the metal ions such as Fe and Ni ions were removed more efficiently compared with monovalent ions such as K and Na ions.…”